Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim Yong Tae | - |
| dc.contributor.author | 이창우 | - |
| dc.contributor.author | 박상규 | - |
| dc.contributor.author | Min Suk-Ki | - |
| dc.date.accessioned | 2024-01-13T22:30:33Z | - |
| dc.date.available | 2024-01-13T22:30:33Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/112061 | - |
| dc.language | English | - |
| dc.title | Characteristics of amorphous tungsten nitride diffusion barrier for metal-organic chemical vapor deposited Cu metallization. | - |
| dc.type | Conference | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.bibliographicCitation | Int'l electron devices and materials symp., pp.? | - |
| dc.citation.title | Int'l electron devices and materials symp. | - |
| dc.citation.startPage | ? | - |
| dc.citation.endPage | ? | - |
| dc.citation.conferencePlace | CH | - |
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