Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim Yong Tae | - |
| dc.contributor.author | 이창우 | - |
| dc.contributor.author | 권철순 | - |
| dc.date.accessioned | 2024-01-13T22:30:38Z | - |
| dc.date.available | 2024-01-13T22:30:38Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/112066 | - |
| dc.language | English | - |
| dc.title | Thermal stability of plasma deposited tungsten nitride thin films for VLSI devices. | - |
| dc.type | Conference | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.bibliographicCitation | 1-st China-Korea sym. on thin film materials, pp.? | - |
| dc.citation.title | 1-st China-Korea sym. on thin film materials | - |
| dc.citation.startPage | ? | - |
| dc.citation.endPage | ? | - |
| dc.citation.conferencePlace | CC | - |
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