DSpace at KIST: Relationship between the shape of KOH-etched bonding interface and the interfacial oxide condition in silicon direct bonding

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DC Field	Value	Language
dc.contributor.author	Ju Byeong Kwon	-
dc.contributor.author	차균현	-
dc.contributor.author	OH MYUNG HWAN	-
dc.date.accessioned	2024-01-13T22:33:22Z	-
dc.date.available	2024-01-13T22:33:22Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/112230	-
dc.language	English	-
dc.title	Relationship between the shape of KOH-etched bonding interface and the interfacial oxide condition in silicon direct bonding	-
dc.title.alternative	실리콘 직접 접합에 있어서 KOH-식각된 접합계면의 모양과 계면산화막의 상태간의 관계	-
dc.type	Conference	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	전자공학회 하계종합학술대회, 전북대, pp.445 - 448	-
dc.citation.title	전자공학회 하계종합학술대회, 전북대	-
dc.citation.startPage	445	-
dc.citation.endPage	448	-
dc.citation.conferencePlace	KO	-

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