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dc.contributor.authorKANG KWANG NHAM-
dc.contributor.authorLee Jung Il-
dc.contributor.authorJ. H. Jo-
dc.contributor.authorHan Il Ki-
dc.contributor.authorY. J. Lee-
dc.date.accessioned2024-01-13T23:31:15Z-
dc.date.available2024-01-13T23:31:15Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/112637-
dc.languageEnglish-
dc.subjectsilicon nitride films-
dc.titleGrowth and characterization of silicon nitride films by PECVD.-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitation5th ICSFS, Brown U., Providence, USA, Aug. 13-17, 1990, pp.?-
dc.citation.title5th ICSFS, Brown U., Providence, USA, Aug. 13-17, 1990-
dc.citation.startPage?-
dc.citation.endPage?-
dc.citation.conferencePlaceUS-
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