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dc.contributor.author홍순관-
dc.contributor.authorJu Byeong Kwon-
dc.contributor.author김철주-
dc.date.accessioned2024-01-13T23:34:04Z-
dc.date.available2024-01-13T23:34:04Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/112801-
dc.languageEnglish-
dc.titleElimination of hole traps on Si wafer using reoxidation method-
dc.title.alternativeReoxidatoin법을 이용한 Si wafer의 hole trap의 제거-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation전자공학회 하계종합학술대회, 포항공대, pp.433 - 435-
dc.citation.title전자공학회 하계종합학술대회, 포항공대-
dc.citation.startPage433-
dc.citation.endPage435-
dc.citation.conferencePlaceKO-
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