Oxidation Behavior and Chromium Vaporization of Ion Implanted Crofer22APU

Authors
Hong, Seung HeeMadakashira, PhanirajKim, Dong-IkCho, Young WhanHan, Seung HeeHan, Heung Nam
Issue Date
2009
Publisher
ELECTROCHEMICAL SOC INC
Citation
11th International Symposium on Solid Oxide Fuel Cells (SOFC), v.25, no.2, pp.1437 - 1446
Abstract
Crofer 22APU, used for interconnects in solid oxide fuel cells (SOFCs), is studied to improve its oxidation resistance and to suppress chromium vaporization from the oxide scales. Carbon and nitrogen were implanted on the plate surface by the ion implantation method. These samples were subjected to oxidation at 800 degrees C for 500 hours. Oxidation kinetics was determined by measuring weight gains at regular time intervals. Experiments to determine chromium volatility from the samples were conducted at 800 degrees C in a tube furnace in flowing air. The chromium vapors were collected on a silicon wafer and Rutherford Backscattering Spectroscopy (RBS) was used to measure the chromium vaporization rates. ASR measurements were also carried out on the samples. AES, SEM/EDS and TEM were used to characterize the initial and oxidized surface of the samples. The ion-implanted samples show significantly less chromium vaporization rate than the unimplanted samples.
ISSN
1938-5862
URI
https://pubs.kist.re.kr/handle/201004/116047
DOI
10.1149/1.3205676
Appears in Collections:
KIST Conference Paper > 2009
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE