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dc.contributor.authorRathod, Kunalsinh N.-
dc.contributor.authorGadani, Keval-
dc.contributor.authorDhruv, Davit-
dc.contributor.authorShrimali, Vipul G.-
dc.contributor.authorSolanki, Sapana-
dc.contributor.authorJoshi, Ashvini D.-
dc.contributor.authorSingh, Jitendra P.-
dc.contributor.authorChae, Keun H.-
dc.contributor.authorAsokan, Kandasami-
dc.contributor.authorSolanki, Piyush S.-
dc.contributor.authorShah, Nikesh A.-
dc.date.accessioned2024-01-19T16:04:13Z-
dc.date.available2024-01-19T16:04:13Z-
dc.date.created2022-01-11-
dc.date.issued2020-11-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/117877-
dc.description.abstractIn this study, we investigate the effect of ion irradiation on Y0.95Ca0.05MnO3 (YCMO) thin films. X-ray diffraction and Raman spectroscopy measurements show single-phase and strain/stress modifications with ion irradiation. Rutherford backscattering spectrometry confirms the variation in oxygen vacancies. The near-edge x-ray absorption fine structure shows valence state reduction of Mn ions, which is attributed to oxygen vacancies. The optimal resistive switching ratio is observed at the lowest fluence (1x10(11)ions/cm(2)) of ion irradiation. At higher fluences (1x10(12) and 1x10(13)ions/cm(2)), the strain relaxation and oxygen vacancy annihilation are ascribed to the local annealing effect. The double logarithmic curve and modified Langmuir-Child's law satisfy the space charge limited conduction mechanism in all thin films. These results suggest the crucial role of irradiation-induced oxygen vacancies in modifying the electronic structure and electrical properties of YCMO thin films.-
dc.languageEnglish-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectVOLTAGE CHARACTERISTICS-
dc.subjectDOMAIN-WALLS-
dc.titleEffect of oxygen vacancy gradient on ion-irradiated Ca-doped YMnO3 thin films-
dc.typeArticle-
dc.identifier.doi10.1116/6.0000507-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.38, no.6-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume38-
dc.citation.number6-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000590770000002-
dc.identifier.scopusid2-s2.0-85096110869-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusVOLTAGE CHARACTERISTICS-
dc.subject.keywordPlusDOMAIN-WALLS-
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KIST Article > 2020
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