Highly Stable Contact Doping in Organic Field Effect Transistors by Dopant-Blockade Method

Authors
Kim, YoungrokBroch, KatharinaLee, WoocheolAhn, HebeomLee, JonghoonYoo, DaekyoungKim, JunwooChung, SeungjunSirringhaus, HenningKang, KeehoonLee, Takhee
Issue Date
2020-07
Publisher
WILEY-V C H VERLAG GMBH
Citation
ADVANCED FUNCTIONAL MATERIALS, v.30, no.28
Abstract
In organic device applications, a high contact resistance between metal electrodes and organic semiconductors prevents an efficient charge injection and extraction, which fundamentally limits the device performance. Recently, various contact doping methods have been reported as an effective way to resolve the contact resistance problem. However, the contact doping has not been explored extensively in organic field effect transistors (OFETs) due to dopant diffusion problem, which significantly degrades the device stability by damaging the ON/OFF switching performance. Here, the stability of a contact doping method is improved by incorporating "dopant-blockade molecules" in the poly(2,5-bis(3-hexadecylthiophen-2-yl)thieno[3,2-b]thiophene) (PBTTT) film in order to suppress the diffusion of the dopant molecules. By carefully selecting the dopant-blockade molecules for effectively blocking the dopant diffusion paths, the ON/OFF ratio of PBTTT OFETs can be maintained over 2 months. This work will maximize the potential of OFETs by employing the contact doping method as a promising route toward resolving the contact resistance problem.
Keywords
SELF-ASSEMBLED MONOLAYERS; SEMICONDUCTING POLYMER-FILMS; CHARGE INJECTION; HIGH-MOBILITY; MOLECULAR DOPANT; PERFORMANCE; TRANSPORT; DIFFUSION; AMBIPOLAR; ELECTRON; SELF-ASSEMBLED MONOLAYERS; SEMICONDUCTING POLYMER-FILMS; CHARGE INJECTION; HIGH-MOBILITY; MOLECULAR DOPANT; PERFORMANCE; TRANSPORT; DIFFUSION; AMBIPOLAR; ELECTRON; 2; 3; 5; 6-tetrafluoro-7; 7; 8; 8-tetracyanoquinodimethane; contact doping; dopant-blockade; poly(2; 5-bis(3-hexadecylthiophen-2-yl)thieno[3; 2-b]thiophene); solid-state diffusion; tetracyanoquinodimethane
ISSN
1616-301X
URI
https://pubs.kist.re.kr/handle/201004/118432
DOI
10.1002/adfm.202000058
Appears in Collections:
KIST Article > 2020
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