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dc.contributor.authorJhon, YM-
dc.contributor.authorKim, DH-
dc.contributor.authorChu, H-
dc.contributor.authorLee, CW-
dc.contributor.authorChoi, SS-
dc.date.accessioned2024-01-19T18:08:39Z-
dc.date.available2024-01-19T18:08:39Z-
dc.date.created2022-03-07-
dc.date.issued1995-
dc.identifier.issn0272-9172-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/119054-
dc.languageEnglish-
dc.publisherMATERIALS RESEARCH SOC-
dc.titleCharacteristics of excimer-laser-crystallized polysilicon films by line beam scanning method-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationSymposium on Beam-Solid Interactions for Materials Synthesis and Characterization, at the 1994 MRS Fall Meeting, v.354, pp.647 - 652-
dc.citation.titleSymposium on Beam-Solid Interactions for Materials Synthesis and Characterization, at the 1994 MRS Fall Meeting-
dc.citation.volume354-
dc.citation.startPage647-
dc.citation.endPage652-
dc.citation.conferencePlaceUS-
dc.citation.conferencePlaceBOSTON, MA-
dc.citation.conferenceDate1994-11-28-
dc.relation.isPartOfBEAM-SOLID INTERACTIONS FOR MATERIALS SYNTHESIS AND CHARACTERIZATION-
dc.identifier.wosidA1995BE68S00096-
dc.identifier.scopusid2-s2.0-0029547468-
dc.type.docTypeProceedings Paper-
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