Selective Detection of Nitrogen-Containing Compound Gases

Authors
Yoo, RanLee, Hyun-SookKim, WonkyungPark, YunjiKoo, AranJin, Sang-HyunThang Viet PhamKim, Myung JongMaeng, SunglyulLee, Wooyoung
Issue Date
2019-08-20
Publisher
MDPI
Citation
SENSORS, v.19, no.16
Abstract
N-containing gaseous compounds, such as trimethylamine (TMA), triethylamine (TEA), ammonia (NH3), nitrogen monoxide (NO), and nitrogen dioxide (NO2) exude irritating odors and are harmful to the human respiratory system at high concentrations. In this study, we investigated the sensing responses of five sensor materials-Al-doped ZnO (AZO) nanoparticles (NPs), Pt-loaded AZO NPs, a Pt-loaded WO3 (Pt-WO3) thin film, an Au-loaded WO3 (Au-WO3) thin film, and N-doped graphene-to the five aforementioned gases at a concentration of 10 parts per million (ppm). The ZnO- and WO3-based materials exhibited n-type semiconducting behavior, and their responses to tertiary amines were significantly higher than those of nitric oxides. The N-doped graphene exhibited p-type semiconducting behavior and responded only to nitric oxides. The Au- and Pt-WO3 thin films exhibited extremely high responses of approximately 100,000 for 10 ppm of triethylamine (TEA) and approximately -2700 for 10 ppm of NO2, respectively. These sensing responses are superior to those of previously reported sensors based on semiconducting metal oxides. On the basis of the sensing response results, we drew radar plots, which indicated that selective pattern recognition could be achieved by using the five sensing materials together. Thus, we demonstrated the possibility to distinguish each type of gas by applying the patterns to recognition techniques.
Keywords
SENSING PROPERTIES; ROOM-TEMPERATURE; SENSITIVE DETECTION; NITRIC-OXIDE; NO GAS; SENSOR; TRIMETHYLAMINE; WO3; FILMS; MECHANISM; SENSING PROPERTIES; ROOM-TEMPERATURE; SENSITIVE DETECTION; NITRIC-OXIDE; NO GAS; SENSOR; TRIMETHYLAMINE; WO3; FILMS; MECHANISM; chemical sensors; nitrogen-containing compound gases; trimethylamine; triethylamine; ammonia; NO; NO2; Al-doped ZnO nanoparticles; WO3 thin film; N-doped graphene
ISSN
1424-8220
URI
https://pubs.kist.re.kr/handle/201004/119674
DOI
10.3390/s19163565
Appears in Collections:
KIST Article > 2019
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