Efficient hydrogen evolution performance of phase-pure NiS electrocatalysts grown on fluorine-doped tin oxide-coated glass by facile chemical bath deposition

Authors
Rahman, GulChae, Sang YounJoo, Oh-shim
Issue Date
2018-07-19
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Citation
INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, v.43, no.29, pp.13022 - 13031
Abstract
The production of hydrogen, the future fuel, on stable, efficient, and robust electrocatalysts represents an attractive approach for the conversion and storage of carbon-free energy resources. In this study, earth-abundant nickel sulfide (NiS) electrocatalyst were grown on fluorine-doped tin oxide (FTO) substrate by a simple and cost-effective chemical bath deposition for hydrogen evolution reaction (HER). Energy dispersive X-ray analysis and Xray photoelectron spectra indicated the presence of highly pure NiS. The HER performance of the catalyst was examined in alkaline solution (1.0 M NaOH; pH = 13.5). Notably, NiS film prepared at 100 degrees C demonstrated superior HER activity with an overpotential of 290 mV to afford a current density of 10 mA/cm(2) and a Tafel slope of 143.4 mV/dec which are among the promising results obtained for sulfide-based HER electrocatalysts. The catalyst exhibited 100% faradaic efficiency and electrochemical stability which indicate its potential as noble-metal-free HER electrocatalyst. (C) 2018 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.
Keywords
NICKEL SULFIDE NANOPARTICLES; METAL-ORGANIC FRAMEWORKS; CATALYTIC-ACTIVITY; NEUTRAL WATER; FILMS; STORAGE; ELECTRODEPOSITION; NANOSHEETS; SURFACE; SITES; NICKEL SULFIDE NANOPARTICLES; METAL-ORGANIC FRAMEWORKS; CATALYTIC-ACTIVITY; NEUTRAL WATER; FILMS; STORAGE; ELECTRODEPOSITION; NANOSHEETS; SURFACE; SITES; Hydrogen evolution reaction; Nickel sulfide; Electrocatalyst; Chemical bath deposition
ISSN
0360-3199
URI
https://pubs.kist.re.kr/handle/201004/121143
DOI
10.1016/j.ijhydene.2018.05.049
Appears in Collections:
KIST Article > 2018
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