Enhanced Thermoelectric Conversion Efficiency of CVD Graphene with Reduced Grain Sizes
- Authors
- Lim, Gyumin; Kihm, Kenneth David; Kim, Hong Goo; Lee, Woorim; Lee, Woomin; Pyun, Kyung Rok; Cheon, Sosan; Lee, Phillip; Min, Jin Young; Ko, Seung Hwan
- Issue Date
- 2018-07
- Publisher
- MDPI
- Citation
- NANOMATERIALS, v.8, no.7
- Abstract
- The grain size of CVD (Chemical Vapor Deposition) graphene was controlled by changing the precursor gas flow rates, operation temperature, and chamber pressure. Graphene of average grain sizes of 4.1 mu m, 2.2 mu m, and 0.5 mu m was synthesized in high quality and full coverage. The possibility to tailor the thermoelectric conversion characteristics of graphene has been exhibited by examining the grain size effect on the three elementary thermal and electrical properties of sigma-, S, and k. Electrical conductivity (sigma) and Seebeck coefficients (S) were measured in a vacuum for supported graphene on SiO2/Si FET (Field Effect Transistor) substrates so that the charge carrier density could be changed by applying a gate voltage (V-G). Mobility (mu) values of 529, 459, and 314 cm(2)/V.s for holes and 1042, 745, and 490 cm(2)/V.s for electrons for the three grain sizes of 4.1 mu m, 2.2 mu m, and 0.5 mu m, respectively, were obtained from the slopes of the measured sigma- vs. V-G graphs. The power factor (PF), the electrical portion of the thermoelectric figure of merit (ZT), decreased by about one half as the grain size was decreased, while the thermal conductivity (k) decreased by one quarter for the same grain decrease. Finally, the resulting ZT increased more than two times when the grain size was reduced from 4.1 mu m to 0.5 mu m.
- Keywords
- CHEMICAL-VAPOR-DEPOSITION; SINGLE-CRYSTAL GRAPHENE; RAMAN-SPECTROSCOPY; ELECTRICAL-TRANSPORT; GROWTH; CU; FILMS; CHEMICAL-VAPOR-DEPOSITION; SINGLE-CRYSTAL GRAPHENE; RAMAN-SPECTROSCOPY; ELECTRICAL-TRANSPORT; GROWTH; CU; FILMS; thermoelectric conversion efficiency; CVD graphene; grain sizes; FET 4-point measurements; electrical conductivity; Seebeck coefficient
- ISSN
- 2079-4991
- URI
- https://pubs.kist.re.kr/handle/201004/121210
- DOI
- 10.3390/nano8070557
- Appears in Collections:
- KIST Article > 2018
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