Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ju, Gun wu | - |
dc.contributor.author | Kim, Hansung | - |
dc.contributor.author | Shim, Jae Phil | - |
dc.contributor.author | Kim, Seong Kwang | - |
dc.contributor.author | Lee, Byeong-Hyeon | - |
dc.contributor.author | Won, Sung Ok | - |
dc.contributor.author | Kim, Sanghyeon | - |
dc.contributor.author | Kim, Hyung-jun | - |
dc.date.accessioned | 2024-01-19T23:04:55Z | - |
dc.date.available | 2024-01-19T23:04:55Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 2018-03 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/121648 | - |
dc.description.abstract | The anisotropic surface morphology of a tensile-strained In0.42Al0.58As layer grown on an InP(100) substrate was investigated by means of observing the cross-hatch patterns between two orthogonal in-plane directions: [011] and [0 (1) over bar1]. Analysis results using atomic force microscopy evidently reveal a higher array density along direction [011], with an asymmetrically sharp ridge across each array. Conversely, there was a much lower array density along direction [0 (1) over bar1] and a symmetrically big mound-like ridges. Our X-ray diffraction and energy-dispersive spectroscopy analyses showed a more substantial amount of strain relaxation along direction [0 (1) over bar1] due to preferential indium incorporation along [011]. As a result, the big mound ridges over the arrays along direction [0 (1) over bar1] were believed to be the result of local indium accumulation. Additionally, microcrack formations, penetrating into substrates, were exclusively formed on top of the mound ridges with central depressions along direction [0 (1) over bar1], presumably causing additional anisotropic strain relaxation. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.title | Anisotropic surface morphology in a tensile-strained InAlAs layer grown on InP(100) substrates | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.tsf.2018.01.026 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.649, pp.38 - 42 | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 649 | - |
dc.citation.startPage | 38 | - |
dc.citation.endPage | 42 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000427524100007 | - |
dc.identifier.scopusid | 2-s2.0-85041446968 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | CROSS-HATCH SURFACE | - |
dc.subject.keywordPlus | GAAS 001 | - |
dc.subject.keywordPlus | HETEROSTRUCTURES | - |
dc.subject.keywordPlus | DISLOCATION | - |
dc.subject.keywordPlus | INGAAS | - |
dc.subject.keywordPlus | EVOLUTION | - |
dc.subject.keywordPlus | SI(001) | - |
dc.subject.keywordAuthor | Epitaxial growth | - |
dc.subject.keywordAuthor | III-V compound semiconductor | - |
dc.subject.keywordAuthor | Cross-hatch array | - |
dc.subject.keywordAuthor | Preferential surface diffusion | - |
dc.subject.keywordAuthor | Microcrack | - |
dc.subject.keywordAuthor | Anisotropic strain relaxation | - |
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