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dc.contributor.authorKang, JoonHyun-
dc.contributor.authorKim, Young-Hwan-
dc.contributor.authorKwon, Seok Joon-
dc.contributor.authorPark, Joon-Suh-
dc.contributor.authorPark, Kyoung Wan-
dc.contributor.authorPark, Jae-Gwan-
dc.contributor.authorHan, Il Ki-
dc.date.accessioned2024-01-20T00:01:56Z-
dc.date.available2024-01-20T00:01:56Z-
dc.date.created2021-09-03-
dc.date.issued2017-12-
dc.identifier.issn0021-4922-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/121990-
dc.description.abstractSurface smoothing of indium tin oxide (ITO) film by laser irradiation was demonstrated. The ITO surface was etched by choline radicals, which were activated by laser irradiation at a wavelength of 532nm. The RMS surface roughness was improved from 5.6 to 4.6 nm after 10 min of laser irradiation. We also showed the changes in the surface morphology of the ITO film with various irradiation powers and times. (C) 2017 The Japan Society of Applied Physics-
dc.languageEnglish-
dc.publisherIOP PUBLISHING LTD-
dc.subjectLIGHT-EMITTING DEVICES-
dc.subjectTHIN-FILMS-
dc.titleSurface smoothing of indium tin oxide film by laser-induced photochemical etching-
dc.typeArticle-
dc.identifier.doi10.7567/JJAP.56.128003-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.56, no.12-
dc.citation.titleJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.citation.volume56-
dc.citation.number12-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000414676000003-
dc.identifier.scopusid2-s2.0-85039148677-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusLIGHT-EMITTING DEVICES-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordAuthorsurface smoothing-
dc.subject.keywordAuthordressed photon-
dc.subject.keywordAuthorlaser-induced photochemical etching-
dc.subject.keywordAuthorIndium tin oxide-
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