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dc.contributor.authorKim, Gun Hwan-
dc.contributor.authorJu, Hyunsu-
dc.contributor.authorYang, Min Kyu-
dc.contributor.authorLee, Dong Kyu-
dc.contributor.authorChoi, Ji Woon-
dc.contributor.authorJang, Jae Hyuck-
dc.contributor.authorLee, Sang Gil-
dc.contributor.authorCha, Ik Su-
dc.contributor.authorPark, Bo Keun-
dc.contributor.authorHan, Jeong Hwan-
dc.contributor.authorChung, Taek-Mo-
dc.contributor.authorKim, Kyung Min-
dc.contributor.authorHwang, Cheol Seong-
dc.contributor.authorLee, Young Kuk-
dc.date.accessioned2024-01-20T00:04:53Z-
dc.date.available2024-01-20T00:04:53Z-
dc.date.created2021-09-03-
dc.date.issued2017-10-25-
dc.identifier.issn1613-6810-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/122149-
dc.description.abstractThe quadruple-level cell technology is demonstrated in an Au/Al2O3/HfO2/TiN resistance switching memory device using the industry-standard incremental step pulse programming (ISPP) and error checking/correction (ECC) methods. With the highly optimistic properties of the tested device, such as self-compliance and gradual set-switching behaviors, the device shows 6s reliability up to 16 states with a state current gap value of 400 nA for the total allowable programmed current range from 2 to 11 mu A. It is demonstrated that the conventional ISPP/ECC can be applied to such resistance switching memory, which may greatly contribute to the commercialization of the device, especially competitively with NAND flash. A relatively minor improvement in the material and circuitry may enable even a five-bits-per-cell technology, which can hardly be imagined in NAND flash, whose state-of-the-art multiple-cell technology is only at three-level (eight states) to this day.-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectTHERMAL AGITATION-
dc.subjectMEMORY-
dc.subjectDIODE-
dc.subjectCOST-
dc.titleFour-Bits-Per-Cell Operation in an HfO2-Based Resistive Switching Device-
dc.typeArticle-
dc.identifier.doi10.1002/smll.201701781-
dc.description.journalClass1-
dc.identifier.bibliographicCitationSMALL, v.13, no.40-
dc.citation.titleSMALL-
dc.citation.volume13-
dc.citation.number40-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000413416400006-
dc.identifier.scopusid2-s2.0-85032855933-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusTHERMAL AGITATION-
dc.subject.keywordPlusMEMORY-
dc.subject.keywordPlusDIODE-
dc.subject.keywordPlusCOST-
dc.subject.keywordAuthorerror checking/correction (ECC) algorithm-
dc.subject.keywordAuthorHfO2-
dc.subject.keywordAuthorincremental step pulse programming (ISPP)-
dc.subject.keywordAuthorquadruple-level cell (QLC)-
dc.subject.keywordAuthorresistive switching (RS) memory-
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KIST Article > 2017
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