Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching

Abstract

The surface of poly(methyl methacrylate) (PMMA) film was etched by laser irradiation under O-2 and vacuum conditions. By activating the O-2 molecules near the rough surface, oxygen radicals will preferably etch the protrusions on the PMMA surface. Three lasers of different wavelengths were used for comparison. Laser irradiation at a short wavelength such as 325 nm resulted in high etch rates whereas a long wavelength such as 532 nm resulted in no effect on the surface profile. The PMMA surface was not etched under the vacuum condition, indicating the necessity of O-2 molecules in etching. (C) 2017 The Japan Society of Applied Physics