Directly deposited MoS2 thin film electrodes for high performance supercapacitors

Authors
Choudhary, NitinPatel, MumukshuHo, Yee-HsienDahotre, Narendra B.Lee, WonkiHwang, Jun YeonChoi, Wonbong
Issue Date
2015-12
Publisher
Royal Society of Chemistry
Citation
Journal of Materials Chemistry A, v.3, no.47, pp.24049 - 24054
Abstract
Two dimensional (2D) layered materials have recently attracted significant research interest owing to their unique physical and chemical properties for efficient electrochemical energy storage devices. Here, we present a neoteric approach to fabricate high performance MoS2 thin film supercapacitor electrodes by using a direct magnetron sputtering technique. The novel three-dimensional (3D) porous structure of the MoS2 film exhibits an excellent capacitance of similar to 330 F cm(-3) along with a high volumetric power and energy density of 40-80 W cm(-3) and 1.6-2.4 mW h cm(-3), respectively. Moreover, the optimized MoS2 electrode shows an outstanding cyclic stability, yielding capacitance retention over 97% after 5000 cycles of charging/discharging. The contemporary approach to MoS2 supercapacitor electrode fabrication will enable new opportunities in flexible electronic and energy devices.
Keywords
ENERGY-STORAGE; LAYER MOS2; VOLUMETRIC CAPACITANCE; MICRO-SUPERCAPACITORS; HIGH-POWER; NANOSHEETS; GROWTH; CARBON; DEVICES; CELLS; MoS2; Supercapacitor; TEM; thin film
ISSN
2050-7488
URI
https://pubs.kist.re.kr/handle/201004/124682
DOI
10.1039/c5ta08095a
Appears in Collections:
KIST Article > 2015
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