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dc.contributor.authorLee, Albert S.-
dc.contributor.authorChoi, Seung-Sock-
dc.contributor.authorOh, Sung Yeoun-
dc.contributor.authorLee, He Seung-
dc.contributor.authorKim, Bomin-
dc.contributor.authorHwang, Seung Sang-
dc.contributor.authorBaek, Kyung-Youl-
dc.date.accessioned2024-01-20T05:34:44Z-
dc.date.available2024-01-20T05:34:44Z-
dc.date.created2021-09-05-
dc.date.issued2015-11-
dc.identifier.issn2050-7526-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/124821-
dc.description.abstractPoly(methyl) silsesquioxane-based spin-on-glass resins incorporating both a cyclic precursor, 1,3,5,7-tetramethyl 1,3,5,7-tetrahydroxyl cyclosiloxane, and incompletely condensed methyl-substituted POSS were synthesized and their thermal, mechanical, and electrical properties were investigated as a function of the POSS loading content. By introducing incompletely condensed methyl-substituted POSS compounds at the molecular level as sol-gel precursors, exceptional thermal stability (4700 degrees C), good mechanical properties (elastic modulus >4.0 GPa), and an ultra-low dielectric constant (k = 1.8) were obtained. In addition to providing a new route towards fully poly(methyl) silsesquioxane-based spin-on-glass resins with the above properties, the realization of the application of integration circuits was evaluated to show that the ultra low-k, mechanically robust spin-on-glass materials were able to withstand harsh wet chemical and dry etching, as well as chemical mechanical planarization (CMP) processing.-
dc.languageEnglish-
dc.publisherROYAL SOC CHEMISTRY-
dc.subjectPOLYHEDRAL OLIGOSILSESQUIOXANES-
dc.subjectPOLYSILSESQUIOXANES-
dc.subjectSILSESQUIOXANES-
dc.titleIncompletely condensed POSS-based spin-on-glass networks for impeccable ultra low-k integration-
dc.typeArticle-
dc.identifier.doi10.1039/c5tc02683k-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF MATERIALS CHEMISTRY C, v.3, no.44, pp.11605 - 11611-
dc.citation.titleJOURNAL OF MATERIALS CHEMISTRY C-
dc.citation.volume3-
dc.citation.number44-
dc.citation.startPage11605-
dc.citation.endPage11611-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000364826000006-
dc.identifier.scopusid2-s2.0-84946567876-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusPOLYHEDRAL OLIGOSILSESQUIOXANES-
dc.subject.keywordPlusPOLYSILSESQUIOXANES-
dc.subject.keywordPlusSILSESQUIOXANES-
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