Materialization of strained CVD-graphene using thermal mismatch

Authors
Lee, Seung-MoKim, Sang-MinNa, Min YoungChang, Hye JungKim, Kwang-SeopYu, HyunungLee, Hak-JooKim, Jae-Hyun
Issue Date
2015-06
Publisher
TSINGHUA UNIV PRESS
Citation
NANO RESEARCH, v.8, no.6, pp.2082 - 2091
Abstract
Theoretical physics foretells that "strain engineering" of graphene could hold the key to finding treasures still hidden in two-dimensional (2D) condensed matter physics and commercializing graphene-based devices. However, to produce strained graphene in large quantities is not an easy task by any means. Here, we demonstrate that thermal annealing of graphene placed on various substrates could be a surprisingly simple method for preparing strained graphene with a large area. We found that enhanced graphene-substrate interfacial adhesion plays a critical role in developing strained graphene. Creative device architectures that consider the thermal mismatch between graphene and the target substrate could enable the resulting strain to be intentionally tailored. We believe that our proposed method could suggest a shortcut to realization of graphene straintronics.
Keywords
THERMOMECHANICAL PROPERTIES; THERMOMECHANICAL PROPERTIES; graphene; strain engineering; thermal mismatch; strained graphene
ISSN
1998-0124
URI
https://pubs.kist.re.kr/handle/201004/125395
DOI
10.1007/s12274-015-0719-9
Appears in Collections:
KIST Article > 2015
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