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dc.contributor.authorChoi, Eunmi-
dc.contributor.authorKim, Areum-
dc.contributor.authorKwon, Soon Hyeong-
dc.contributor.authorCui, Yinhua-
dc.contributor.authorLee, Seon Jea-
dc.contributor.authorLee, Ukjae-
dc.contributor.authorChoi, Hee Soo-
dc.contributor.authorHahn, Sang June-
dc.contributor.authorYoon, Sung Pil-
dc.contributor.authorSon, Hyung Bin-
dc.contributor.authorPyo, Sung Gyu-
dc.date.accessioned2024-01-20T08:00:51Z-
dc.date.available2024-01-20T08:00:51Z-
dc.date.created2021-09-04-
dc.date.issued2015-02-
dc.identifier.issn0256-1115-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/125840-
dc.description.abstractThis paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance.-
dc.languageEnglish-
dc.publisherKOREAN INSTITUTE CHEMICAL ENGINEERS-
dc.subjectSENSITIVITY-
dc.titleEffect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor-
dc.typeArticle-
dc.identifier.doi10.1007/s11814-014-0367-x-
dc.description.journalClass1-
dc.identifier.bibliographicCitationKOREAN JOURNAL OF CHEMICAL ENGINEERING, v.32, no.2, pp.199 - 201-
dc.citation.titleKOREAN JOURNAL OF CHEMICAL ENGINEERING-
dc.citation.volume32-
dc.citation.number2-
dc.citation.startPage199-
dc.citation.endPage201-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.identifier.kciidART001957453-
dc.identifier.wosid000349086400001-
dc.identifier.scopusid2-s2.0-84925534700-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryEngineering, Chemical-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaEngineering-
dc.type.docTypeArticle-
dc.subject.keywordPlusSENSITIVITY-
dc.subject.keywordAuthorCMOS Image Sensor-
dc.subject.keywordAuthorCMP-
dc.subject.keywordAuthorFocal Length-
dc.subject.keywordAuthorWhite Sensitivity-
dc.subject.keywordAuthorDead Zone-
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KIST Article > 2015
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