Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Choi, Eunmi | - |
dc.contributor.author | Kim, Areum | - |
dc.contributor.author | Kwon, Soon Hyeong | - |
dc.contributor.author | Cui, Yinhua | - |
dc.contributor.author | Lee, Seon Jea | - |
dc.contributor.author | Lee, Ukjae | - |
dc.contributor.author | Choi, Hee Soo | - |
dc.contributor.author | Hahn, Sang June | - |
dc.contributor.author | Yoon, Sung Pil | - |
dc.contributor.author | Son, Hyung Bin | - |
dc.contributor.author | Pyo, Sung Gyu | - |
dc.date.accessioned | 2024-01-20T08:00:51Z | - |
dc.date.available | 2024-01-20T08:00:51Z | - |
dc.date.created | 2021-09-04 | - |
dc.date.issued | 2015-02 | - |
dc.identifier.issn | 0256-1115 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/125840 | - |
dc.description.abstract | This paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance. | - |
dc.language | English | - |
dc.publisher | KOREAN INSTITUTE CHEMICAL ENGINEERS | - |
dc.subject | SENSITIVITY | - |
dc.title | Effect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor | - |
dc.type | Article | - |
dc.identifier.doi | 10.1007/s11814-014-0367-x | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.32, no.2, pp.199 - 201 | - |
dc.citation.title | KOREAN JOURNAL OF CHEMICAL ENGINEERING | - |
dc.citation.volume | 32 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 199 | - |
dc.citation.endPage | 201 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.identifier.kciid | ART001957453 | - |
dc.identifier.wosid | 000349086400001 | - |
dc.identifier.scopusid | 2-s2.0-84925534700 | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Engineering, Chemical | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Engineering | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SENSITIVITY | - |
dc.subject.keywordAuthor | CMOS Image Sensor | - |
dc.subject.keywordAuthor | CMP | - |
dc.subject.keywordAuthor | Focal Length | - |
dc.subject.keywordAuthor | White Sensitivity | - |
dc.subject.keywordAuthor | Dead Zone | - |
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