Chemical Vapor Deposition on Chabazite (CHA) Zeolite Membranes for Effective Post-Combustion CO2 Capture

Authors
Kim, EunjooLee, TaeheeKim, HyungminJung, Won-JinHan, Doug-YoungBaik, HionsuckChoi, NakwonChoi, Jungkyu
Issue Date
2014-12-16
Publisher
American Chemical Society
Citation
Environmental Science & Technology, v.48, no.24, pp.14828 - 14836
Abstract
Chabazite (CHA) zeolites with a pore size of 0.37 x 0.42 nm(2) are expected to separate CO2 (0.33 nm) from larger N-2 (0.364 nm) in postcombustion flue gases by recognizing their minute size differences. Furthermore, the hydrophobic siliceous constituent in CHA membranes can allow for maintaining the CO2/N-2 separation performance in the presence of H2O in contrast with the CO2 affinity-based membranes. In an attempt to increase the molecular sieving ability, the pore mouth size of all silica CHA (Si-CHA) particles was reduced via the chemical vapor deposition (CVD) of a silica precursor (tetraethyl orthosilicate). Accordingly, an increase of the CVD treatment duration decreased the penetration rate of CO2 into the CVD-treated Si-CHA particles. Furthermore, the CVD process was applied to siliceous CHA membranes in order to improve their CO2/N-2 separation performance. Compared to the intact CHA membranes, the CO2/N-2 maximum separation factor (max SF) for CVD-treated CHA membranes was increased by similar to 2 fold under dry conditions. More desirably, the CO2/N-2 max SF was increased by similar to 3 fold under wet conditions at similar to 50 degrees C, a representative temperature of the flue gas stream. In fact, the presence of H2O in the feed disfavored the permeation of N-2 more than that of CO2 through CVD-modified CHA membranes and thus, contributed to the increased CO2/N-2 separation factor.
Keywords
GAS PERMEATION PROPERTIES; OF-THE-ART; SAPO-34 MEMBRANES; SEPARATION PERFORMANCE; ADSORPTION PROPERTIES; CARBON-DIOXIDE; IONIC LIQUIDS; HIGH-FLUX; SI-CHA; DDR; GAS PERMEATION PROPERTIES; OF-THE-ART; SAPO-34 MEMBRANES; SEPARATION PERFORMANCE; ADSORPTION PROPERTIES; CARBON-DIOXIDE; IONIC LIQUIDS; HIGH-FLUX; SI-CHA; DDR
ISSN
0013-936X
URI
https://pubs.kist.re.kr/handle/201004/125988
DOI
10.1021/es504265p
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KIST Article > 2014
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