Full metadata record

DC Field Value Language
dc.contributor.authorJo, Yongcheol-
dc.contributor.authorJung, Kyooho-
dc.contributor.authorKim, Jongmin-
dc.contributor.authorWoo, Hyeonseok-
dc.contributor.authorHan, Jaeseok-
dc.contributor.authorKim, Hyungsang-
dc.contributor.authorHong, Jinpyo-
dc.contributor.authorLee, Jeon-Kook-
dc.contributor.authorIm, Hyunsik-
dc.date.accessioned2024-01-20T08:04:01Z-
dc.date.available2024-01-20T08:04:01Z-
dc.date.created2021-09-05-
dc.date.issued2014-12-08-
dc.identifier.issn2045-2322-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/126001-
dc.description.abstractThis work reports on a mechanism for irreversible resistive switching (RS) transformation from bipolar to unipolar RS behavior in SrRuO3 (SRO)/Cr-doped SrZrO3 (SZO:Cr)/Pt capacitor structures prepared on a Ti/SiO2/Si substrate. Counter-clockwise bipolar RS memory current-voltage (I-V) characteristics are observed within the RS voltage window of -2.5 to +1.9 V, with good endurance and retention properties. As the bias voltage increases further beyond 4 V under a forward bias, a forming process occurs resulting in irreversible RS mode transformation from bipolar to unipolar mode. This switching mode transformation is a direct consequence of thermally activated Ti out-diffusion from a Ti adhesion layer. Transition metal Ti effectively out-diffuses through the loose Pt electrode layer at high substrate temperatures, leading to the unintended formation of a thin titanium oxide (TiOx where x < 2) layer between the Pt electrode and the SZO:Cr layer as well as additional Ti atoms in the SZO:Cr layer. Cross-sectional scanning electron microscopy, transmission electron microscopy and Auger electron spectroscopy depth-profile measurements provided apparent evidence of the Ti out-diffusion phenomenon. We propose that the out-diffusion-induced additional Ti atoms in the SZO:Cr layer contributes to the creation of the metallic filamentary channels.-
dc.languageEnglish-
dc.publisherNATURE PUBLISHING GROUP-
dc.subjectTHIN-FILMS-
dc.subjectOXIDE-FILMS-
dc.subjectMEMORY-
dc.subjectELECTRODES-
dc.subjectEVOLUTION-
dc.titleResistance switching mode transformation in SrRuO3/Cr-doped SrZrO3/Pt frameworks via a thermally activated Ti out-diffusion process-
dc.typeArticle-
dc.identifier.doi10.1038/srep07354-
dc.description.journalClass1-
dc.identifier.bibliographicCitationSCIENTIFIC REPORTS, v.4-
dc.citation.titleSCIENTIFIC REPORTS-
dc.citation.volume4-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000346273700002-
dc.identifier.scopusid2-s2.0-84923233657-
dc.relation.journalWebOfScienceCategoryMultidisciplinary Sciences-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.type.docTypeArticle-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusOXIDE-FILMS-
dc.subject.keywordPlusMEMORY-
dc.subject.keywordPlusELECTRODES-
dc.subject.keywordPlusEVOLUTION-
dc.subject.keywordAuthorresistance switching-
dc.subject.keywordAuthorSrRuO3-
dc.subject.keywordAuthorCr doped SrZrO3-
dc.subject.keywordAuthorTi out-diffusion-
Appears in Collections:
KIST Article > 2014
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE