Roles of an oxygen Frenkel pair in the photoluminescence of Bi3+-doped Y2O3: computational predictions and experimental verifications
- Authors
- Choi, Heechae; Cho, So Hye; Khan, Sovann; Lee, Kwang-Ryeol; Kim, Seungchul
- Issue Date
- 2014-08-14
- Publisher
- ROYAL SOC CHEMISTRY
- Citation
- JOURNAL OF MATERIALS CHEMISTRY C, v.2, no.30, pp.6017 - 6024
- Abstract
- Bi3+ as a dopant in wide-band-gap yttria (Y2O3) has been used as a green light emission center or a sensitizer of co-doped rare earth elements. Because the photoluminescence (PL) properties of Y2O3:Bi3+ vary remarkably according to heat treatment, the roles of point defects have been an open question. By using first-principles calculations and thermodynamic modeling, we have thoroughly investigated the formation of point defects in Y2O3:Bi3+ at varying oxygen partial pressures and temperatures, as well as their rotes in PL. The photoabsorption energies of the Bi3+ dopant were predicted to be 3.1 eV and 3.4 eV for doping at the S-6 and the C-2 sites, respectively, values that are in good agreement with the experimental values. It was predicted that an oxygen interstitial (01) and an oxygen vacancy (V-O) are the dominant defects of Y2O3:Bi3+ at ambient pressure and an annealing temperature of 1300 K (3.19 x 10(16) cm(-3) for 1% Bi doping), and the concentrations of these defects in doped Y2O3 are approximately two orders of magnitude higher than those in undoped Y2O3. The defect V-O(2+) in Y2O3:Bi3+ was predicted to reduce the intensity of PL from Bi3+ at both S-6 and C-2 sites. We verify our computational predictions from our experiments that the stronger PL of both 410 and 500 nm wavelengths was measured for the samples annealed at higher oxygen partial pressure.
- Keywords
- GENERALIZED GRADIENT APPROXIMATION; LUMINESCENCE PROPERTIES; TRANSPARENT CERAMICS; PERFORMANCE; PHOSPHORS; OXIDE; BI3+; GENERALIZED GRADIENT APPROXIMATION; LUMINESCENCE PROPERTIES; TRANSPARENT CERAMICS; PERFORMANCE; PHOSPHORS; OXIDE; BI3+; photoluminescence; Y2O3; first principles calculations; Bi doping; Oxygen pressure; annealing
- ISSN
- 2050-7526
- URI
- https://pubs.kist.re.kr/handle/201004/126469
- DOI
- 10.1039/c4tc00438h
- Appears in Collections:
- KIST Article > 2014
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