Roles of an oxygen Frenkel pair in the photoluminescence of Bi3+-doped Y2O3: computational predictions and experimental verifications

Authors
Choi, HeechaeCho, So HyeKhan, SovannLee, Kwang-RyeolKim, Seungchul
Issue Date
2014-08-14
Publisher
ROYAL SOC CHEMISTRY
Citation
JOURNAL OF MATERIALS CHEMISTRY C, v.2, no.30, pp.6017 - 6024
Abstract
Bi3+ as a dopant in wide-band-gap yttria (Y2O3) has been used as a green light emission center or a sensitizer of co-doped rare earth elements. Because the photoluminescence (PL) properties of Y2O3:Bi3+ vary remarkably according to heat treatment, the roles of point defects have been an open question. By using first-principles calculations and thermodynamic modeling, we have thoroughly investigated the formation of point defects in Y2O3:Bi3+ at varying oxygen partial pressures and temperatures, as well as their rotes in PL. The photoabsorption energies of the Bi3+ dopant were predicted to be 3.1 eV and 3.4 eV for doping at the S-6 and the C-2 sites, respectively, values that are in good agreement with the experimental values. It was predicted that an oxygen interstitial (01) and an oxygen vacancy (V-O) are the dominant defects of Y2O3:Bi3+ at ambient pressure and an annealing temperature of 1300 K (3.19 x 10(16) cm(-3) for 1% Bi doping), and the concentrations of these defects in doped Y2O3 are approximately two orders of magnitude higher than those in undoped Y2O3. The defect V-O(2+) in Y2O3:Bi3+ was predicted to reduce the intensity of PL from Bi3+ at both S-6 and C-2 sites. We verify our computational predictions from our experiments that the stronger PL of both 410 and 500 nm wavelengths was measured for the samples annealed at higher oxygen partial pressure.
Keywords
GENERALIZED GRADIENT APPROXIMATION; LUMINESCENCE PROPERTIES; TRANSPARENT CERAMICS; PERFORMANCE; PHOSPHORS; OXIDE; BI3+; GENERALIZED GRADIENT APPROXIMATION; LUMINESCENCE PROPERTIES; TRANSPARENT CERAMICS; PERFORMANCE; PHOSPHORS; OXIDE; BI3+; photoluminescence; Y2O3; first principles calculations; Bi doping; Oxygen pressure; annealing
ISSN
2050-7526
URI
https://pubs.kist.re.kr/handle/201004/126469
DOI
10.1039/c4tc00438h
Appears in Collections:
KIST Article > 2014
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE