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dc.contributor.authorKim, Kwang-Chon-
dc.contributor.authorBaek, Seung-Hyub-
dc.contributor.authorKim, Hyun Jae-
dc.contributor.authorHyun, Dow-Bin-
dc.contributor.authorKim, Seong Keun-
dc.contributor.authorKim, Jin-Sang-
dc.date.accessioned2024-01-20T09:34:05Z-
dc.date.available2024-01-20T09:34:05Z-
dc.date.created2021-09-05-
dc.date.issued2014-06-
dc.identifier.issn0361-5235-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/126745-
dc.description.abstractThe thermoelectric properties of I-doped Bi2Te3 films grown by metal-organic chemical vapor deposition have been studied. I-doped epitaxial (00l) Bi2Te3 films were successfully grown on 4A degrees tilted GaAs (001) substrates at 360 A degrees C. I concentration in the Bi2Te3 films was easily controlled by the variation in a flow rate of H-2 carrier gas for the delivery of an isopropyliodide precursor. As I ions in the as-grown Bi2Te3 films were not fully activated, they did not influence the carrier concentration and thermoelectric properties. However, a post-annealing process at 400 A degrees C activated I ions as a donor, accompanied with an increase in the carrier concentration. Interestingly, the I-doped Bi2Te3 films after the post-annealing process also exhibited enhancement of the Seebeck coefficient at the same electron concentration compared to un-doped Bi2Te3 films. Through doping I ions into Bi2Te3, the thermopower was also enhanced in Bi2Te3, and a high power factor of 5 x 10(-3) W K-2 m(-1) was achieved.-
dc.languageEnglish-
dc.publisherSPRINGER-
dc.titleThermopower Enhancement of Bi2Te3 Films by Doping I Ions-
dc.typeArticle-
dc.identifier.doi10.1007/s11664-013-2934-z-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF ELECTRONIC MATERIALS, v.43, no.6, pp.2000 - 2005-
dc.citation.titleJOURNAL OF ELECTRONIC MATERIALS-
dc.citation.volume43-
dc.citation.number6-
dc.citation.startPage2000-
dc.citation.endPage2005-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000336372400079-
dc.identifier.scopusid2-s2.0-84901947320-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordAuthorMOCVD-
dc.subject.keywordAuthorBi2Te3-
dc.subject.keywordAuthorthermoelectric property-
dc.subject.keywordAuthoriodine doping-
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KIST Article > 2014
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