Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Kwang-Chon | - |
dc.contributor.author | Baek, Seung-Hyub | - |
dc.contributor.author | Kim, Hyun Jae | - |
dc.contributor.author | Hyun, Dow-Bin | - |
dc.contributor.author | Kim, Seong Keun | - |
dc.contributor.author | Kim, Jin-Sang | - |
dc.date.accessioned | 2024-01-20T09:34:05Z | - |
dc.date.available | 2024-01-20T09:34:05Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2014-06 | - |
dc.identifier.issn | 0361-5235 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/126745 | - |
dc.description.abstract | The thermoelectric properties of I-doped Bi2Te3 films grown by metal-organic chemical vapor deposition have been studied. I-doped epitaxial (00l) Bi2Te3 films were successfully grown on 4A degrees tilted GaAs (001) substrates at 360 A degrees C. I concentration in the Bi2Te3 films was easily controlled by the variation in a flow rate of H-2 carrier gas for the delivery of an isopropyliodide precursor. As I ions in the as-grown Bi2Te3 films were not fully activated, they did not influence the carrier concentration and thermoelectric properties. However, a post-annealing process at 400 A degrees C activated I ions as a donor, accompanied with an increase in the carrier concentration. Interestingly, the I-doped Bi2Te3 films after the post-annealing process also exhibited enhancement of the Seebeck coefficient at the same electron concentration compared to un-doped Bi2Te3 films. Through doping I ions into Bi2Te3, the thermopower was also enhanced in Bi2Te3, and a high power factor of 5 x 10(-3) W K-2 m(-1) was achieved. | - |
dc.language | English | - |
dc.publisher | SPRINGER | - |
dc.title | Thermopower Enhancement of Bi2Te3 Films by Doping I Ions | - |
dc.type | Article | - |
dc.identifier.doi | 10.1007/s11664-013-2934-z | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF ELECTRONIC MATERIALS, v.43, no.6, pp.2000 - 2005 | - |
dc.citation.title | JOURNAL OF ELECTRONIC MATERIALS | - |
dc.citation.volume | 43 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 2000 | - |
dc.citation.endPage | 2005 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000336372400079 | - |
dc.identifier.scopusid | 2-s2.0-84901947320 | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | MOCVD | - |
dc.subject.keywordAuthor | Bi2Te3 | - |
dc.subject.keywordAuthor | thermoelectric property | - |
dc.subject.keywordAuthor | iodine doping | - |
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