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dc.contributor.authorKang, Woonggi-
dc.contributor.authorJung, Minwoo-
dc.contributor.authorCha, Wonsuk-
dc.contributor.authorJang, Sukjae-
dc.contributor.authorYoon, Youngwoon-
dc.contributor.authorKim, Hyunjung-
dc.contributor.authorSon, Hae Jung-
dc.contributor.authorLee, Doh-Kwon-
dc.contributor.authorKim, BongSoo-
dc.contributor.authorCho, Jeong Ho-
dc.date.accessioned2024-01-20T09:34:59Z-
dc.date.available2024-01-20T09:34:59Z-
dc.date.created2021-09-05-
dc.date.issued2014-05-14-
dc.identifier.issn1944-8244-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/126790-
dc.description.abstractWe characterized the electrical properties of a field-effect transistor (FET) and a nonvolatile memory device based on a solution-processable low bandgap small molecule, Si1TDPP-EE-C6. The small molecule consisted of electron-rich thiophene-dithienosilole-thiophene (Si1T) units and electron-deficient diketopyrrolopyrrole (DPP) units. The as-spun Si1TDPP-EE-C6 FET device exhibited ambipolar transport properties with a hole mobility of 7.3 X 10(-5) cm(2)/(V s) and an electron mobility of 1.6 X 10(-5) cm(2) /(V s). Thermal annealing at 110 degrees C led to a significant increase in carrier mobility, with hole and electron mobilities of 3.7 X 10(-3) and 5.1 X 10(-4) cm(2)/(Vs), respectively. This improvement is strongly correlated with the increased film crystallinity and reduced pi-pi intermolecular stacking distance upon thermal annealing, revealed by grazing incidence X-ray diffraction (GIXD) and atomic force microscopy (AFM) measurements. In addition, nonvolatile memory devices based on Si1TDPP-EE-C6 were successfully fabricated by incorporating Au nanoparticles (AuNPs) as charge trapping sites at the interface between the silicon oxide (SiO2) and cross-linked poly(4-vinylphenol) (cPVP) dielectrics. The device exhibited reliable nonvolatile memory characteristics, including a wide memory window of 98 V, a high on/off-current ratio of 1 X 10(3), and good electrical reliability. Overall, we demonstrate that donor-acceptor-type small molecules are a potentially important class of materials for ambipolar FETs and nonvolatile memory applications.-
dc.languageEnglish-
dc.publisherAmerican Chemical Society-
dc.subjectFIELD-EFFECT TRANSISTORS-
dc.subjectTHIN-FILM TRANSISTORS-
dc.subjectHIGH-PERFORMANCE-
dc.subjectMATERIALS DESIGN-
dc.subjectN-CHANNEL-
dc.subjectPOLYMER-
dc.subjectELECTRON-
dc.subjectHOLE-
dc.subjectSUBSTITUTION-
dc.subjectMOBILITIES-
dc.titleHigh Crystalline Dithienosilole-Cored Small Molecule Semiconductor for Ambipolar Transistor and Nonvolatile Memory-
dc.typeArticle-
dc.identifier.doi10.1021/am500080p-
dc.description.journalClass1-
dc.identifier.bibliographicCitationACS Applied Materials & Interfaces, v.6, no.9, pp.6589 - 6597-
dc.citation.titleACS Applied Materials & Interfaces-
dc.citation.volume6-
dc.citation.number9-
dc.citation.startPage6589-
dc.citation.endPage6597-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000336075300071-
dc.identifier.scopusid2-s2.0-84900869244-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.type.docTypeArticle-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusTHIN-FILM TRANSISTORS-
dc.subject.keywordPlusHIGH-PERFORMANCE-
dc.subject.keywordPlusMATERIALS DESIGN-
dc.subject.keywordPlusN-CHANNEL-
dc.subject.keywordPlusPOLYMER-
dc.subject.keywordPlusELECTRON-
dc.subject.keywordPlusHOLE-
dc.subject.keywordPlusSUBSTITUTION-
dc.subject.keywordPlusMOBILITIES-
dc.subject.keywordAuthordonor-acceptor-type small molecules-
dc.subject.keywordAuthorambipolar field effect transistor-
dc.subject.keywordAuthornonvolatile memory-
dc.subject.keywordAuthorcrystallinity-
dc.subject.keywordAuthorhole mobility-
dc.subject.keywordAuthorcharge trapping-
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