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dc.contributor.authorLee, Hak-Joo-
dc.contributor.authorCho, Jung-Min-
dc.contributor.authorKim, Inho-
dc.contributor.authorLee, Seung-Cheol-
dc.contributor.authorPark, Jong-Keuk-
dc.contributor.authorBaik, Young-Joon-
dc.contributor.authorLee, Wook-Seong-
dc.date.accessioned2024-01-20T10:00:57Z-
dc.date.available2024-01-20T10:00:57Z-
dc.date.created2021-09-05-
dc.date.issued2014-05-
dc.identifier.issn1612-8850-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/126837-
dc.description.abstractThe grain-refinement mechanisms involved during the deposition of diamond films by direct-current plasma assisted chemical vapor deposition (DC-PACVD) were investigated as a function of the inter-electrode electric field (IEEF). As IEEF was increased from 260 to 940Vcm(-1), the local electron temperatures near the growth front increased strongly; as a result, a strong grain refinement occurred ultimately yielding ultrananocrystalline diamond films (UNCD). Such observations were attributed to novel features of the DC-PACVD, including the electron-stimulated desorption (ESD) of the hydrogen-terminated moieties located at the surface, and the consequently enhanced generation of bi-radical sites at the growing diamond surface.-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.titleAn Insight into Grain Refinement Mechanism of Ultrananocrystalline Diamond Films Obtained by Direct Current Plasma-Assisted Chemical Vapor Deposition-
dc.typeArticle-
dc.identifier.doi10.1002/ppap.201300146-
dc.description.journalClass1-
dc.identifier.bibliographicCitationPLASMA PROCESSES AND POLYMERS, v.11, no.5, pp.437 - 447-
dc.citation.titlePLASMA PROCESSES AND POLYMERS-
dc.citation.volume11-
dc.citation.number5-
dc.citation.startPage437-
dc.citation.endPage447-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000335671200004-
dc.identifier.scopusid2-s2.0-84899899147-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Fluids & Plasmas-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalWebOfScienceCategoryPolymer Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalResearchAreaPolymer Science-
dc.type.docTypeArticle-
dc.subject.keywordPlusENERGY-
dc.subject.keywordPlusPRESSURE-
dc.subject.keywordPlusBIAS-ENHANCED NUCLEATION-
dc.subject.keywordPlusHOT-FILAMENT-
dc.subject.keywordPlusION-BOMBARDMENT-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusSTRUCTURAL-PROPERTIES-
dc.subject.keywordPlusELECTRON-EMISSION-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordAuthorchemical vapor deposition (CVD)-
dc.subject.keywordAuthorDC plasmas-
dc.subject.keywordAuthorelectron stimulated desorptions-
dc.subject.keywordAuthorgrain refinement-
dc.subject.keywordAuthorultrananocrystalline diamond films-
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KIST Article > 2014
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