Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Hak-Joo | - |
dc.contributor.author | Cho, Jung-Min | - |
dc.contributor.author | Kim, Inho | - |
dc.contributor.author | Lee, Seung-Cheol | - |
dc.contributor.author | Park, Jong-Keuk | - |
dc.contributor.author | Baik, Young-Joon | - |
dc.contributor.author | Lee, Wook-Seong | - |
dc.date.accessioned | 2024-01-20T10:00:57Z | - |
dc.date.available | 2024-01-20T10:00:57Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2014-05 | - |
dc.identifier.issn | 1612-8850 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/126837 | - |
dc.description.abstract | The grain-refinement mechanisms involved during the deposition of diamond films by direct-current plasma assisted chemical vapor deposition (DC-PACVD) were investigated as a function of the inter-electrode electric field (IEEF). As IEEF was increased from 260 to 940Vcm(-1), the local electron temperatures near the growth front increased strongly; as a result, a strong grain refinement occurred ultimately yielding ultrananocrystalline diamond films (UNCD). Such observations were attributed to novel features of the DC-PACVD, including the electron-stimulated desorption (ESD) of the hydrogen-terminated moieties located at the surface, and the consequently enhanced generation of bi-radical sites at the growing diamond surface. | - |
dc.language | English | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.title | An Insight into Grain Refinement Mechanism of Ultrananocrystalline Diamond Films Obtained by Direct Current Plasma-Assisted Chemical Vapor Deposition | - |
dc.type | Article | - |
dc.identifier.doi | 10.1002/ppap.201300146 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | PLASMA PROCESSES AND POLYMERS, v.11, no.5, pp.437 - 447 | - |
dc.citation.title | PLASMA PROCESSES AND POLYMERS | - |
dc.citation.volume | 11 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 437 | - |
dc.citation.endPage | 447 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000335671200004 | - |
dc.identifier.scopusid | 2-s2.0-84899899147 | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Fluids & Plasmas | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalWebOfScienceCategory | Polymer Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalResearchArea | Polymer Science | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | ENERGY | - |
dc.subject.keywordPlus | PRESSURE | - |
dc.subject.keywordPlus | BIAS-ENHANCED NUCLEATION | - |
dc.subject.keywordPlus | HOT-FILAMENT | - |
dc.subject.keywordPlus | ION-BOMBARDMENT | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | STRUCTURAL-PROPERTIES | - |
dc.subject.keywordPlus | ELECTRON-EMISSION | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordPlus | SURFACE | - |
dc.subject.keywordAuthor | chemical vapor deposition (CVD) | - |
dc.subject.keywordAuthor | DC plasmas | - |
dc.subject.keywordAuthor | electron stimulated desorptions | - |
dc.subject.keywordAuthor | grain refinement | - |
dc.subject.keywordAuthor | ultrananocrystalline diamond films | - |
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