Microstructural variation and dielectric properties of KTiNbO5 and K3Ti5NbO14 ceramics

Authors
Im, MirKweon, Sang-HyoKim, Jin-SeongNahm, SahnChoi, Ji-WonHwang, Seong-Ju
Issue Date
2014-05
Publisher
ELSEVIER SCI LTD
Citation
CERAMICS INTERNATIONAL, v.40, no.4, pp.5861 - 5867
Abstract
KTiNbO5 (KTN) and K3Ti5NbO14 (3K5TN) ceramics sintered at 1150 degrees C and 1125 degrees C, respectively, exhibited a dense, homogeneous microstructure with a high relative density (>= 96% of the theoretical density). Abnormal grain growth occurred in both specimens during sintering, and large (002) and (001) grains developed in KTN and 3K5TN ceramics, respectively. A dielectric constant (epsilon(r)) of 13 and a dielectric loss of 2.9% at 10 MHz were obtained from KTN ceramics sintered at 1150 degrees C. The 3K5TN ceramics sintered at 1125 degrees C showed an epsilon(r) of 15 and a dielectric loss of 12% at 10 MHz. The resistivity of KTN and 3K5TN ceramics was low and their epsilon(r) and dielectric loss values displayed lowfrequency dispersion (LFD); the presence of K+ ions between the layers could be responsible for their low resistivity and LFD. (C) 2013 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
Keywords
THIN-FILMS; OXIDE; DEPOSITION; NANOSHEETS; THIN-FILMS; OXIDE; DEPOSITION; NANOSHEETS; Dielectric properties; Layered metal-oxide; Nanosheets; Multilayer ceramic capacitor
ISSN
0272-8842
URI
https://pubs.kist.re.kr/handle/201004/126860
DOI
10.1016/j.ceramint.2013.11.028
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KIST Article > 2014
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