Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Cho, Kwang-Hwan | - |
dc.contributor.author | Kang, Min-Gyu | - |
dc.contributor.author | Jang, Ho Won | - |
dc.contributor.author | Shin, Hyun Yong | - |
dc.contributor.author | Kang, Chong-Yun | - |
dc.contributor.author | Yoon, Seok-Jin | - |
dc.date.accessioned | 2024-01-20T15:01:54Z | - |
dc.date.available | 2024-01-20T15:01:54Z | - |
dc.date.created | 2021-08-31 | - |
dc.date.issued | 2012-05 | - |
dc.identifier.issn | 1862-6254 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/129320 | - |
dc.description.abstract | We report the fabrication of organic thin-film transistors (OTFTs) with high-k gate dielectrics of Mn-doped Bi2Ti2O7 (BTO) films. 3% Mn-doped BTO films deposited on polymer substrates by pulsed laser deposition at room temperature exhibit low leakage currents of 2.1 x 10(8) A/cm2 at an applied electric field of 0.3 MV/cm, while undoped BTO films show much higher leakage currents of 4.3 x 10(4) A/cm2. Mn doping effectively reduces the number of oxygen vacancies in the films and improves the electrical properties. Low operation voltage and significantly reduced leakage currents are demonstrated in pentacene-based OTFTs with the Mn-doped BTO gate dielectrics. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim | - |
dc.language | English | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | PULSED-LASER DEPOSITION | - |
dc.subject | CHEMICAL SOLUTION DECOMPOSITION | - |
dc.subject | ELECTRICAL-PROPERTIES | - |
dc.subject | STRONTIUM-TITANATE | - |
dc.subject | INSULATORS | - |
dc.title | Significantly reduced leakage currents in organic thin film transistors with Mn-doped Bi2Ti2O7 high-k gate dielectrics | - |
dc.type | Article | - |
dc.identifier.doi | 10.1002/pssr.201206080 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v.6, no.5, pp.208 - 210 | - |
dc.citation.title | PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | - |
dc.citation.volume | 6 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 208 | - |
dc.citation.endPage | 210 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000303760000014 | - |
dc.identifier.scopusid | 2-s2.0-84860672671 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | PULSED-LASER DEPOSITION | - |
dc.subject.keywordPlus | CHEMICAL SOLUTION DECOMPOSITION | - |
dc.subject.keywordPlus | ELECTRICAL-PROPERTIES | - |
dc.subject.keywordPlus | STRONTIUM-TITANATE | - |
dc.subject.keywordPlus | INSULATORS | - |
dc.subject.keywordAuthor | OTFT | - |
dc.subject.keywordAuthor | high-k gate dielectrics | - |
dc.subject.keywordAuthor | BiTiO | - |
dc.subject.keywordAuthor | leakage currents | - |
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