Significantly reduced leakage currents in organic thin film transistors with Mn-doped Bi2Ti2O7 high-k gate dielectrics
- Authors
- Cho, Kwang-Hwan; Kang, Min-Gyu; Jang, Ho Won; Shin, Hyun Yong; Kang, Chong-Yun; Yoon, Seok-Jin
- Issue Date
- 2012-05
- Publisher
- WILEY-V C H VERLAG GMBH
- Citation
- PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v.6, no.5, pp.208 - 210
- Abstract
- We report the fabrication of organic thin-film transistors (OTFTs) with high-k gate dielectrics of Mn-doped Bi2Ti2O7 (BTO) films. 3% Mn-doped BTO films deposited on polymer substrates by pulsed laser deposition at room temperature exhibit low leakage currents of 2.1 x 10(8) A/cm2 at an applied electric field of 0.3 MV/cm, while undoped BTO films show much higher leakage currents of 4.3 x 10(4) A/cm2. Mn doping effectively reduces the number of oxygen vacancies in the films and improves the electrical properties. Low operation voltage and significantly reduced leakage currents are demonstrated in pentacene-based OTFTs with the Mn-doped BTO gate dielectrics. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
- Keywords
- PULSED-LASER DEPOSITION; CHEMICAL SOLUTION DECOMPOSITION; ELECTRICAL-PROPERTIES; STRONTIUM-TITANATE; INSULATORS; PULSED-LASER DEPOSITION; CHEMICAL SOLUTION DECOMPOSITION; ELECTRICAL-PROPERTIES; STRONTIUM-TITANATE; INSULATORS; OTFT; high-k gate dielectrics; BiTiO; leakage currents
- ISSN
- 1862-6254
- URI
- https://pubs.kist.re.kr/handle/201004/129320
- DOI
- 10.1002/pssr.201206080
- Appears in Collections:
- KIST Article > 2012
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