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dc.contributor.authorSingh, J.P.-
dc.contributor.authorSulania, I.-
dc.contributor.authorPrakash, J.-
dc.contributor.authorGautam, S.-
dc.contributor.authorChae, K.H.-
dc.contributor.authorKanjilal, D.-
dc.contributor.authorAsokan, K.-
dc.date.accessioned2024-01-20T15:04:24Z-
dc.date.available2024-01-20T15:04:24Z-
dc.date.created2021-08-31-
dc.date.issued2012-04-
dc.identifier.issn0976-3961-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/129420-
dc.description.abstractPresent work reports 200 MeV Ag15+ irradiation induced effects on the surface morphology, grain size and local electronic structure in MgO thin films deposited by e-beam evaporation under ultra High vacuum. The grain size was found to decrease from 37 nm (pristine film) to 23 nm for the sample irradiated with fluence of 1×1012 ions/cm2 and thereafter it increases upto fluence of 5×1012 ions/cm2. Similar changes with ion fluence were also observed for surface roughness. Shifting and disappearance of peaks in X-ray absorption spectra with irradiation shows the electronic structure modification after irradiation. The detailed analysis of observed results has been done on the basis of existing theories. ? 2012 VBRI Press.-
dc.languageEnglish-
dc.publisherVBRI Press-
dc.titleStudy of surface morphology and grain size of irradiated MgO thin films-
dc.typeArticle-
dc.identifier.doi10.5185/amlett.2012.1307-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAdvanced Materials Letters, v.3, no.2, pp.112 - 117-
dc.citation.titleAdvanced Materials Letters-
dc.citation.volume3-
dc.citation.number2-
dc.citation.startPage112-
dc.citation.endPage117-
dc.description.journalRegisteredClassscopus-
dc.identifier.scopusid2-s2.0-84873054681-
dc.type.docTypeArticle-
dc.subject.keywordAuthorAtomic force microscopy-
dc.subject.keywordAuthorMgO-
dc.subject.keywordAuthorX-ray absorption spectroscopy-
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