Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Choo, Sung Joong | - |
dc.contributor.author | Park, Jung Ho | - |
dc.contributor.author | Lee, Sangyoup | - |
dc.contributor.author | Shin, Hyun-Joon | - |
dc.date.accessioned | 2024-01-20T15:05:20Z | - |
dc.date.available | 2024-01-20T15:05:20Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2012-03 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/129459 | - |
dc.description.abstract | An integrated Mach-Zehnder interferometric chip operating at 632.8 nm was designed and fabricated using planar rib waveguide technology for optical sensor applications. A rib waveguide with a silicon-oxynitride core layer and silicon-oxide clad layers was geometrically designed to have a single-mode operation and a high surface sensitivity by using an effective index method. A chromium mask layer was employed as an etch stop to protect the core layer of the rib waveguide and was patterned using an image reversal process with a photo mask applied to the sensor zone. The image reversal process was modified in order to obtain a longer chromium mask layer against the sensor zone. We have, therefore, established a fabrication method for an integrated Mach-Zehnder interferometric sensor without the addition of a new photo mask. The optical measurement with this device for a mixture of deionized water (DIW) and phosphate buffer solution (PBS) finally showed a sensitivity of about pi/(6.25 x 10(-4)). | - |
dc.language | English | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.title | An Integrated Mach-Zehnder Interferometric Sensor Fabricated by Using Cr Mask Extension Lithography | - |
dc.type | Article | - |
dc.identifier.doi | 10.3938/jkps.60.744 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.60, no.5, pp.744 - 749 | - |
dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.volume | 60 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 744 | - |
dc.citation.endPage | 749 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.identifier.kciid | ART001642927 | - |
dc.identifier.wosid | 000304099600013 | - |
dc.identifier.scopusid | 2-s2.0-84859984008 | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | Mach-Zehnder interferometric chip | - |
dc.subject.keywordAuthor | Rib waveguide | - |
dc.subject.keywordAuthor | Silicon-oxynitride | - |
dc.subject.keywordAuthor | Chromium mask layer | - |
dc.subject.keywordAuthor | Image reversal process | - |
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