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Mussel-Inspired Block Copolymer Lithography for Low Surface Energy Materials of Teflon, Graphene, and Gold

Authors
Kim, Bong Hoon; Lee, Duck Hyun; Kim, Ju Young; Shin, Dong Ok; Jeong, Hu Young; Hong, Seonki; Yun, Je Moon; Koo, Chong Min; Lee, Haeshin; Kim, Sang Ouk
Issue Date
2011-12-15
Publisher
WILEY-V C H VERLAG GMBH
Citation
ADVANCED MATERIALS, v.23, no.47, pp.5618 - +
Abstract
Mussel-inspired interfacial engineering is synergistically integrated with block copolymer (BCP) lithography for the surface nanopatterning of low surface energy substrate materials, including, Teflon, graphene, and gold. The image shows the Teflon nanowires and their excellent superhydrophobicity.
Keywords
CUTICULAR WAXES; LARGE-AREA; GRAPHOEPITAXY; FABRICATION; CUTICLE; CUTICULAR WAXES; LARGE-AREA; GRAPHOEPITAXY; FABRICATION; CUTICLE; adhesives; surface energy; block copolymers; nanopatterning; graphene
ISSN
0935-9648
URI
https://pubs.kist.re.kr/handle/201004/129718
DOI
10.1002/adma.201103650
Appears in Collections:
KIST Article > 2011
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