Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Yun Hoe | - |
dc.contributor.author | Song, Jong-Han | - |
dc.contributor.author | Kim, Jin Sang | - |
dc.contributor.author | Yoon, Seok-Jin | - |
dc.contributor.author | Park, Kyung Bong | - |
dc.contributor.author | Choi, Ji-Won | - |
dc.date.accessioned | 2024-01-20T16:01:57Z | - |
dc.date.available | 2024-01-20T16:01:57Z | - |
dc.date.created | 2021-09-04 | - |
dc.date.issued | 2011-11-01 | - |
dc.identifier.issn | 0169-4332 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/129812 | - |
dc.description.abstract | The dielectric properties of MgO-Ta2O5 continuous composition spread (CCS) thin films were investigated. The MgO-Ta2O5 CCS thin films were deposited on Pt/Ti/SiO2/Si substrates by off-Axis RF magnetron sputtering system, and then the films were annealed at 350 degrees C with rapid thermal annealing system in vacuum. The dielectric constant and loss of MgO-Ta2O5 CCS thin films were plotted via 1500 micron-step measuring. The specific point of Ta2O5-MgO CCS thin film (post annealed at 350 degrees C) showing superior dielectric properties of high dielectric constant (k similar to 28) and low dielectric loss (tan delta < 0.004) at 1 MHz were found in the area of 3-5 mm apart from Ta2O5 side on the substrate. The cation's composition of thin film was Mg:Ta = 0.4:2 at%. (C) 2011 Elsevier B. V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | MIM CAPACITORS | - |
dc.subject | DENSITY | - |
dc.subject | METAL | - |
dc.subject | PERFORMANCE | - |
dc.subject | ELECTRODE | - |
dc.title | Dielectric properties of continuous composition spreaded MgO-Ta2O5 thin films | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.apsusc.2011.09.004 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | APPLIED SURFACE SCIENCE, v.258, no.2, pp.843 - 847 | - |
dc.citation.title | APPLIED SURFACE SCIENCE | - |
dc.citation.volume | 258 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 843 | - |
dc.citation.endPage | 847 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000296525800034 | - |
dc.identifier.scopusid | 2-s2.0-80054034902 | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | MIM CAPACITORS | - |
dc.subject.keywordPlus | DENSITY | - |
dc.subject.keywordPlus | METAL | - |
dc.subject.keywordPlus | PERFORMANCE | - |
dc.subject.keywordPlus | ELECTRODE | - |
dc.subject.keywordAuthor | High-k | - |
dc.subject.keywordAuthor | Thin films | - |
dc.subject.keywordAuthor | Continuous composition spread | - |
dc.subject.keywordAuthor | RF magnetron sputtering | - |
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