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dc.contributor.authorKim, Yun Hoe-
dc.contributor.authorSong, Jong-Han-
dc.contributor.authorKim, Jin Sang-
dc.contributor.authorYoon, Seok-Jin-
dc.contributor.authorPark, Kyung Bong-
dc.contributor.authorChoi, Ji-Won-
dc.date.accessioned2024-01-20T16:01:57Z-
dc.date.available2024-01-20T16:01:57Z-
dc.date.created2021-09-04-
dc.date.issued2011-11-01-
dc.identifier.issn0169-4332-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/129812-
dc.description.abstractThe dielectric properties of MgO-Ta2O5 continuous composition spread (CCS) thin films were investigated. The MgO-Ta2O5 CCS thin films were deposited on Pt/Ti/SiO2/Si substrates by off-Axis RF magnetron sputtering system, and then the films were annealed at 350 degrees C with rapid thermal annealing system in vacuum. The dielectric constant and loss of MgO-Ta2O5 CCS thin films were plotted via 1500 micron-step measuring. The specific point of Ta2O5-MgO CCS thin film (post annealed at 350 degrees C) showing superior dielectric properties of high dielectric constant (k similar to 28) and low dielectric loss (tan delta < 0.004) at 1 MHz were found in the area of 3-5 mm apart from Ta2O5 side on the substrate. The cation&apos;s composition of thin film was Mg:Ta = 0.4:2 at%. (C) 2011 Elsevier B. V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.subjectMIM CAPACITORS-
dc.subjectDENSITY-
dc.subjectMETAL-
dc.subjectPERFORMANCE-
dc.subjectELECTRODE-
dc.titleDielectric properties of continuous composition spreaded MgO-Ta2O5 thin films-
dc.typeArticle-
dc.identifier.doi10.1016/j.apsusc.2011.09.004-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAPPLIED SURFACE SCIENCE, v.258, no.2, pp.843 - 847-
dc.citation.titleAPPLIED SURFACE SCIENCE-
dc.citation.volume258-
dc.citation.number2-
dc.citation.startPage843-
dc.citation.endPage847-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000296525800034-
dc.identifier.scopusid2-s2.0-80054034902-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusMIM CAPACITORS-
dc.subject.keywordPlusDENSITY-
dc.subject.keywordPlusMETAL-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusELECTRODE-
dc.subject.keywordAuthorHigh-k-
dc.subject.keywordAuthorThin films-
dc.subject.keywordAuthorContinuous composition spread-
dc.subject.keywordAuthorRF magnetron sputtering-
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