Pt/Ti/Al2O3/Al tunnel junctions exhibiting electroforming-free bipolar resistive switching behavior

Authors
Jeong, Doo SeokCheong, Byung-kiKohlstedt, Hermann
Issue Date
2011-09
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Citation
SOLID-STATE ELECTRONICS, v.63, no.1, pp.1 - 4
Abstract
We investigated electroforming-free bipolar resistive switching behavior in Pt/Ti/Al2O3/Al tunnel junctions where the Al2O3 tunnel barrier was naturally formed on Al in air. Various compliance current values for the junction's set switching successfully lead to various resistance values in its low resistance state, suggesting the possibility for multi-level-operation. A mechanism for the bipolar switching is qualitatively discussed in terms of the modulation of the tunnel barrier by the reactive Ti layer on top of the barrier. (C) 2011 Elsevier Ltd. All rights reserved.
Keywords
OXIDE; ALUMINUM; MEMORY; OXIDE; ALUMINUM; MEMORY; Memory device; Resistive switching; RRAM
ISSN
0038-1101
URI
https://pubs.kist.re.kr/handle/201004/130046
DOI
10.1016/j.sse.2011.05.028
Appears in Collections:
KIST Article > 2011
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