Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Jung, Sung-Mok | - |
dc.contributor.author | Kim, Young-Hwan | - |
dc.contributor.author | Kim, Seong-Il | - |
dc.contributor.author | Yoo, Sang-Im | - |
dc.date.accessioned | 2024-01-20T17:03:20Z | - |
dc.date.available | 2024-01-20T17:03:20Z | - |
dc.date.created | 2021-09-02 | - |
dc.date.issued | 2011-05 | - |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/130385 | - |
dc.description.abstract | ZnS and ZnS-MgF2 composite films were prepared on soda-lime glass substrates and MgF2 films on GaAs by rf magnetron sputtering to investigate multi-layer antireflection (AR) coatings. Optical constants of these films were determined by envelope method and spectroscopic ellipsometry. In particular, ZnS-MgF2 composite films were fabricated by co-sputtering of ZnS and MgF2 target to obtain intermediate refractive index material for a middle layer in the triple-layer AR coating and these films exhibited the desired intermediate refractive index. Based on the extracted optical constants, single-, double- and triple-layer AR coatings on GaAs substrates were designed and fabricated by rf magnetron sputtering. Low reflectance could be obtained from single-layer AR coating only at a specific wavelength and could be obtained from multi-layer AR coating at wide wavelength regime. Additionally, incident angle dependence of the reflectance of the multi-layer AR coatings was also investigated and showed different behavior according to a number of layers. (C) 2010 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | THIN-FILMS | - |
dc.subject | OPTICAL-PROPERTIES | - |
dc.subject | POROUS SILICON | - |
dc.subject | TEMPERATURE | - |
dc.subject | EVAPORATION | - |
dc.subject | DEPOSITION | - |
dc.subject | THICKNESS | - |
dc.subject | CONSTANTS | - |
dc.title | Design and fabrication of multi-layer antireflection coating for III-V solar cell | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.cap.2010.09.010 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | CURRENT APPLIED PHYSICS, v.11, no.3, pp.538 - 541 | - |
dc.citation.title | CURRENT APPLIED PHYSICS | - |
dc.citation.volume | 11 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 538 | - |
dc.citation.endPage | 541 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.identifier.kciid | ART001553412 | - |
dc.identifier.wosid | 000288183300050 | - |
dc.identifier.scopusid | 2-s2.0-79951670848 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | OPTICAL-PROPERTIES | - |
dc.subject.keywordPlus | POROUS SILICON | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | EVAPORATION | - |
dc.subject.keywordPlus | DEPOSITION | - |
dc.subject.keywordPlus | THICKNESS | - |
dc.subject.keywordPlus | CONSTANTS | - |
dc.subject.keywordAuthor | Zinc sulfide | - |
dc.subject.keywordAuthor | Magnesium fluoride | - |
dc.subject.keywordAuthor | Antireflection coating | - |
dc.subject.keywordAuthor | Optical constants | - |
dc.subject.keywordAuthor | rf magnetron sputtering | - |
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