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dc.contributor.authorKim, Hyunsu-
dc.contributor.authorNoh, Jin-Seo-
dc.contributor.authorRoh, Jong Wook-
dc.contributor.authorChun, Dong Won-
dc.contributor.authorKim, Sungman-
dc.contributor.authorJung, Sang Hyun-
dc.contributor.authorKang, Ho Kwan-
dc.contributor.authorJeong, Won Yong-
dc.contributor.authorLee, Wooyoung-
dc.date.accessioned2024-01-20T18:01:12Z-
dc.date.available2024-01-20T18:01:12Z-
dc.date.created2021-09-04-
dc.date.issued2011-01-
dc.identifier.issn1931-7573-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/130768-
dc.description.abstractA thin FePt film was deposited onto a CrV seed layer at 400 degrees C and showed a high coercivity (similar to 3,400 Oe) and high magnetization (900-1,000 emu/cm(3)) characteristic of L1(0) phase. However, the magnetic properties of patterned media fabricated from the film stack were degraded due to the Ar-ion bombardment. We employed a depositionlast process, in which FePt film deposited at room temperature underwent lift-off and post-annealing processes, to avoid the exposure of FePt to Ar plasma. A patterned medium with 100-nm nano-columns showed an out-of-plane coercivity fivefold larger than its in-plane counterpart and a remanent magnetization comparable to saturation magnetization in the out-of-plane direction, indicating a high perpendicular anisotropy. These results demonstrate the high perpendicular anisotropy in FePt patterned media using a Cr-based compound seed layer for the first time and suggest that ultra-high-density magnetic recording media can be achieved using this optimized top-down approach.-
dc.languageEnglish-
dc.publisherSPRINGER-
dc.titlePerpendicular Magnetic Anisotropy in FePt Patterned Media Employing a CrV Seed Layer-
dc.typeArticle-
dc.identifier.doi10.1007/s11671-010-9755-2-
dc.description.journalClass1-
dc.identifier.bibliographicCitationNANOSCALE RESEARCH LETTERS, v.6-
dc.citation.titleNANOSCALE RESEARCH LETTERS-
dc.citation.volume6-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000289104200013-
dc.identifier.scopusid2-s2.0-79952696076-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusUNDERLAYER-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusIRRADIATION-
dc.subject.keywordPlusCOERCIVITY-
dc.subject.keywordAuthorCrV underlayer-
dc.subject.keywordAuthorE-beam lithography-
dc.subject.keywordAuthorFePt-
dc.subject.keywordAuthorPatterned media-
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KIST Article > 2011
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