Perpendicular Magnetic Anisotropy in FePt Patterned Media Employing a CrV Seed Layer

Authors
Kim, HyunsuNoh, Jin-SeoRoh, Jong WookChun, Dong WonKim, SungmanJung, Sang HyunKang, Ho KwanJeong, Won YongLee, Wooyoung
Issue Date
2011-01
Publisher
SPRINGER
Citation
NANOSCALE RESEARCH LETTERS, v.6
Abstract
A thin FePt film was deposited onto a CrV seed layer at 400 degrees C and showed a high coercivity (similar to 3,400 Oe) and high magnetization (900-1,000 emu/cm(3)) characteristic of L1(0) phase. However, the magnetic properties of patterned media fabricated from the film stack were degraded due to the Ar-ion bombardment. We employed a depositionlast process, in which FePt film deposited at room temperature underwent lift-off and post-annealing processes, to avoid the exposure of FePt to Ar plasma. A patterned medium with 100-nm nano-columns showed an out-of-plane coercivity fivefold larger than its in-plane counterpart and a remanent magnetization comparable to saturation magnetization in the out-of-plane direction, indicating a high perpendicular anisotropy. These results demonstrate the high perpendicular anisotropy in FePt patterned media using a Cr-based compound seed layer for the first time and suggest that ultra-high-density magnetic recording media can be achieved using this optimized top-down approach.
Keywords
THIN-FILMS; UNDERLAYER; TEMPERATURE; IRRADIATION; COERCIVITY; CrV underlayer; E-beam lithography; FePt; Patterned media
ISSN
1931-7573
URI
https://pubs.kist.re.kr/handle/201004/130768
DOI
10.1007/s11671-010-9755-2
Appears in Collections:
KIST Article > 2011
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