Competitive growth mechanisms of InAs quantum dots on InxGa1 (-) As-x layer during post growth interruption

Authors
Yang, ChangjaeKim, JungsubSim, UkLee, JaeyelChoi, Won JunYoon, Euijoon
Issue Date
2010-09-01
Publisher
ELSEVIER SCIENCE SA
Citation
THIN SOLID FILMS, v.518, no.22, pp.6361 - 6364
Abstract
We investigated the effect of the post growth interruption (Cl) on InAs quantum dots (QDs) grown on InxGa1 - xAs strained buffer layers (SBL). When QDs were grown on the 5 and 10% In content SBLs by using post Cl, the size of QDs increased as its density decreased. Based on the 50 meV red-shift of PL in these cases, the transport of materials between QDs leads to the increase of QD size with maintaining its composition during the post GI. On the other hand, when using SBLs with the 15 and 20% In contents, the size of QDs increased, but its density was a little reduced. In addition, PL results were observed blue-shifted by about 20 meV and 2 meV, respectively. Considering the interruption of source gases during the post GI, these observations are strong evidence of the Ga incorporation from 15 and 20% In content SBLs. Therefore, these results imply that the dominant mechanism which increases the size of QDs during the post GI depends on the growth condition of SBL. (c) 2010 Elsevier B.V. All rights reserved.
Keywords
WELL STRUCTURE; PHOTOLUMINESCENCE LINEWIDTH; MU-M; WELL STRUCTURE; PHOTOLUMINESCENCE LINEWIDTH; MU-M; Quantum dot; MOCVD; DWELL structure; Growth interruption
ISSN
0040-6090
URI
https://pubs.kist.re.kr/handle/201004/131112
DOI
10.1016/j.tsf.2010.03.156
Appears in Collections:
KIST Article > 2010
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