Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Jung, Keun | - |
dc.contributor.author | Choi, Won-Kook | - |
dc.contributor.author | Yoon, Seok-Jin | - |
dc.contributor.author | Kim, Hyun Jae | - |
dc.contributor.author | Choi, Ji-Won | - |
dc.date.accessioned | 2024-01-20T18:34:50Z | - |
dc.date.available | 2024-01-20T18:34:50Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2010-08-15 | - |
dc.identifier.issn | 0169-4332 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/131175 | - |
dc.description.abstract | Ga doped ZnO (GZO) thin films were deposited on glass substrates at room temperature by continuous composition spread (CCS) method. CCS is thin films growth method of various GaxZn1-xO(GZO) thin film compositions on a substrate, and evaluating critical properties as a function position, which is directly related to material composition. Various compositions of Ga doped ZnO deposited at room temperature were explored to find excellent electrical and optical properties. Optimized GZO thin films with a low resistivity of 1.46 x 10(-3) Omega cm and an average transmittance above 90% in the 550nm wavelength region were able to be formed at an Ar pressure of 2.66 Pa and a room temperature. Also, optimized composition of the GZO thin film which had the lowest resistivity and high transmittance was found at 0.8 wt.% Ga2O3 doped in ZnO. (C) 2010 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER | - |
dc.subject | OXYGEN PARTIAL-PRESSURE | - |
dc.subject | ZNO FILMS | - |
dc.subject | SUBSTRATE-TEMPERATURE | - |
dc.subject | DEPENDENCE | - |
dc.title | Electrical and optical properties of Ga doped zinc oxide thin films deposited at room temperature by continuous composition spread | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.apsusc.2010.03.144 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | APPLIED SURFACE SCIENCE, v.256, no.21, pp.6219 - 6223 | - |
dc.citation.title | APPLIED SURFACE SCIENCE | - |
dc.citation.volume | 256 | - |
dc.citation.number | 21 | - |
dc.citation.startPage | 6219 | - |
dc.citation.endPage | 6223 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000278595700014 | - |
dc.identifier.scopusid | 2-s2.0-77953137223 | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | OXYGEN PARTIAL-PRESSURE | - |
dc.subject.keywordPlus | ZNO FILMS | - |
dc.subject.keywordPlus | SUBSTRATE-TEMPERATURE | - |
dc.subject.keywordPlus | DEPENDENCE | - |
dc.subject.keywordAuthor | Thin film | - |
dc.subject.keywordAuthor | Continuous composition spread | - |
dc.subject.keywordAuthor | Transparent conducting oxides | - |
dc.subject.keywordAuthor | Ga doped ZnO | - |
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