Negative thermal quenching in undoped ZnO and Ga-doped ZnO film grown on c-Al2O3 (0001) by plasma-assisted molecular beam epitaxy

Authors
Choi, W. K.Park, H. C.Angadi, B.Jung, Y. S.Choi, J. W.
Issue Date
2009-10
Publisher
SPRINGER
Citation
JOURNAL OF ELECTROCERAMICS, v.23, no.2-4, pp.331 - 334
Abstract
Negative thermal quenching (NTQ) was observed in bound exciton emission line in undoped ZnO and the donor-to-valence-band emission in heavily Ga-doped ZnO thin films grown on c-Al2O3 (1000) through low temperature photoluminescence spectra. In both cases, the enhanced feature of PL peak intensity occurred in the temperature range of 35-45 K corresponding to the energies of either excitation to the vibrational/rotational resonance states or the involvement of B-valence band considering the activation energy of about 5 meV.
Keywords
DONOR-ACCEPTOR; BOUND-EXCITON; PHOTOLUMINESCENCE; LUMINESCENCE; TEMPERATURE; EMISSION; OXIDE; BAND; DONOR-ACCEPTOR; BOUND-EXCITON; PHOTOLUMINESCENCE; LUMINESCENCE; TEMPERATURE; EMISSION; OXIDE; BAND; Negative thermal quenching; ZnO; Ga-doped ZnO; B-valence band; Vibrational/rotational resonance states
ISSN
1385-3449
URI
https://pubs.kist.re.kr/handle/201004/132077
DOI
10.1007/s10832-008-9450-1
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KIST Article > 2009
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