Effect of Growth Interruption in Migration Enhanced Epitaxy on InAs/GaAs Quantum Dots

Authors
Ryu, Sung-PilCho, Nam-KiLim, Ju-YoungRim, A-RamChoi, Won-JunSong, Jin-DongLee, Jung-IlLee, Yong-Tak
Issue Date
2009-09
Publisher
JAPAN SOC APPLIED PHYSICS
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.9
Abstract
In this study, we investigated the effect of growth interruption time (t(GI)) during migration enhanced epitaxy (MEE) growth of self-assembled InAs/GaAs quantum dots (QDs) to control the density of the QDs without any substrate rotation stop during QD formation. By manipulating the growth factor (t(Gt)), the control of CID density in the range of 3.4 x 10(9)-3.5 x 10(10) dots/cm(2), as well as the QD shape, was demonstrated. We concluded that three phenomena occur during growth interruption: 1) In re-evaporation, 2) In segregation, and 3) the redistribution of InAs QDs. From photoluminescence (PL), it is found that the emission wavelength of samples increased from 967.7 to 1151.7 nm as t(GI) increased due to redistribution. In addition, we confirmed PL peak emissions from QDs, quasi-three-dimensional (Q3D) clusters, and wetting layer. As a result, the manipulation of t(GI) in the MEE method can control the density, uniformity, size, and wavelength of QDs. (C) 2009 The Japan Society of Applied Physics
Keywords
MOLECULAR-BEAM EPITAXY; INAS; EMISSION; SEGREGATION; MORPHOLOGY; DENSITY; SIZE; GAAS; MOLECULAR-BEAM EPITAXY; INAS; EMISSION; SEGREGATION; MORPHOLOGY; DENSITY; SIZE; GAAS; InAs; Quantum dots; growth interruption
ISSN
0021-4922
URI
https://pubs.kist.re.kr/handle/201004/132208
DOI
10.1143/JJAP.48.091103
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KIST Article > 2009
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