Interfacial Band Bendings in Al Ohmic Contacts to Laser-Irradiated Ga-Face and N-Face n-GaN

Authors
Jang, Ho WonLee, SanghanRyu, Seong WookSon, Jun HoSong, Yang HeeLee, Jong-Lam
Issue Date
2009-08
Publisher
ELECTROCHEMICAL SOC INC
Citation
ELECTROCHEMICAL AND SOLID STATE LETTERS, v.12, no.11, pp.H405 - H407
Abstract
We investigate interfacial band bendings in Al ohmic contacts to laser-irradiated Ga-face and N-face n-GaN using synchrotron radiation photoemission spectroscopy. Both samples show increased band bendings after annealing at 300 degrees C, but annealing at 500 degrees C leads to completely opposite band bendings. These two different behaviors with annealing temperature are consistent with electrical properties of the contacts and are well explained by the annihilation of N vacancies at the interface and the formation of polarization-induced sheet charges at AlN/GaN heterointerfaces, respectively.
Keywords
LIGHT-EMITTING-DIODES; METAL CONTACTS; TI/AL CONTACTS; LIGHT-EMITTING-DIODES; METAL CONTACTS; TI/AL CONTACTS; aluminium compounds; annealing; gallium compounds; III-V semiconductors; ohmic contacts; photoelectron spectra; semiconductor heterojunctions
ISSN
1099-0062
URI
https://pubs.kist.re.kr/handle/201004/132289
DOI
10.1149/1.3206916
Appears in Collections:
KIST Article > 2009
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