Atomic Arrangements of Asymmetrically-tilted Grain Boundaries in 30 degrees Rotation Domains of ZnO Thin Films Grown on n-Si Substrates
- Authors
- Yuk, J. M.; No, Y. S.; Kim, T. W.; Kim, J. Y.; Choi, W. K.
- Issue Date
- 2009-07
- Publisher
- KOREAN PHYSICAL SOC
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.1, pp.246 - 249
- Abstract
- Selected-area electron diffraction patterns for ZnO/Si heterostructures annealed at 800 degrees C showed that 30 degrees rotation domains were generated in the ZnO thin films. The plane-view high-resolution transmission electron microscopy (HRTEM) images for the ZnO thin films grown on n-Si substrates annealed at 800 degrees C showed that asymmetrical tilt grain boundaries were tilted by 16.5 degrees and 13.5 degrees from two grains with a 30 degrees tilted angle. The grain boundary planes of the two grains were (35 (8) over bar0) and (23 (5) over bar0). The atomic arrangements of the asymmetrically-tilted grain boundaries in 30 degrees rotation domains of ZnO thin films grown on n-Si substrates annealed at 800 degrees C are described on the basis of the HRTEM results.
- Keywords
- OPTICAL-PROPERTIES; EPITAXIAL-FILMS; BUFFER LAYER; TEMPERATURE; DEPENDENCE; EMISSION; EDGE; OPTICAL-PROPERTIES; EPITAXIAL-FILMS; BUFFER LAYER; TEMPERATURE; DEPENDENCE; EMISSION; EDGE; ZnO thin film; Si substrate; Rotation domain; Grain boundary; Atomic arrangement
- ISSN
- 0374-4884
- URI
- https://pubs.kist.re.kr/handle/201004/132328
- DOI
- 10.3938/jkps.55.246
- Appears in Collections:
- KIST Article > 2009
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