Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Patil, U. M. | - |
dc.contributor.author | Gurav, K. V. | - |
dc.contributor.author | Joo, Oh-Shim | - |
dc.contributor.author | Lokhande, C. D. | - |
dc.date.accessioned | 2024-01-20T21:05:30Z | - |
dc.date.available | 2024-01-20T21:05:30Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 2009-06-10 | - |
dc.identifier.issn | 0925-8388 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/132395 | - |
dc.description.abstract | Nanocrystalline TiO2 thin films are deposited by simple successive ionic layer adsorption and reaction (SILAR) method on glass and fluorine-doped tin oxide (FTO)-coated glass substrate from aqueous solution. The as-deposited films are heat treated at 673 K for 2 h in air. The change in structural, morphological and optical properties are studied by means of X-ray diffraction (XRD), selected area electron diffraction (SAED), scanning electron microscopy (SEM), Fourier transform infrared (FTIR), transmission electron microscopy (TEM) and UV-vis-NIR spectrophotometer. The results show that the SILAR method allows the formation of anatase, nanocrystalline, and porous TiO2 thin films. The heat-treated film showed conversion efficiency of 0.047% in photoelectrochemical cell with 1 M NaOH electrolyte. (C) 2008 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | IONIC-LAYER-ADSORPTION | - |
dc.subject | DEPOSITION | - |
dc.subject | PHOTOCONDUCTIVITY | - |
dc.subject | NANOPARTICLES | - |
dc.title | Synthesis of photosensitive nanograined TiO2 thin films by SILAR method | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.jallcom.2008.11.160 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF ALLOYS AND COMPOUNDS, v.478, no.1-2, pp.711 - 715 | - |
dc.citation.title | JOURNAL OF ALLOYS AND COMPOUNDS | - |
dc.citation.volume | 478 | - |
dc.citation.number | 1-2 | - |
dc.citation.startPage | 711 | - |
dc.citation.endPage | 715 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000266786400142 | - |
dc.identifier.scopusid | 2-s2.0-67349233671 | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Metallurgy & Metallurgical Engineering | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Metallurgy & Metallurgical Engineering | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | IONIC-LAYER-ADSORPTION | - |
dc.subject.keywordPlus | DEPOSITION | - |
dc.subject.keywordPlus | PHOTOCONDUCTIVITY | - |
dc.subject.keywordPlus | NANOPARTICLES | - |
dc.subject.keywordAuthor | Thin film | - |
dc.subject.keywordAuthor | Titanium dioxide (TiO2) | - |
dc.subject.keywordAuthor | Chemical synthesis | - |
dc.subject.keywordAuthor | Optical properties | - |
dc.subject.keywordAuthor | Photoelectrochemical properties | - |
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