Synthesis of photosensitive nanograined TiO2 thin films by SILAR method
- Authors
- Patil, U. M.; Gurav, K. V.; Joo, Oh-Shim; Lokhande, C. D.
- Issue Date
- 2009-06-10
- Publisher
- ELSEVIER SCIENCE SA
- Citation
- JOURNAL OF ALLOYS AND COMPOUNDS, v.478, no.1-2, pp.711 - 715
- Abstract
- Nanocrystalline TiO2 thin films are deposited by simple successive ionic layer adsorption and reaction (SILAR) method on glass and fluorine-doped tin oxide (FTO)-coated glass substrate from aqueous solution. The as-deposited films are heat treated at 673 K for 2 h in air. The change in structural, morphological and optical properties are studied by means of X-ray diffraction (XRD), selected area electron diffraction (SAED), scanning electron microscopy (SEM), Fourier transform infrared (FTIR), transmission electron microscopy (TEM) and UV-vis-NIR spectrophotometer. The results show that the SILAR method allows the formation of anatase, nanocrystalline, and porous TiO2 thin films. The heat-treated film showed conversion efficiency of 0.047% in photoelectrochemical cell with 1 M NaOH electrolyte. (C) 2008 Elsevier B.V. All rights reserved.
- Keywords
- IONIC-LAYER-ADSORPTION; DEPOSITION; PHOTOCONDUCTIVITY; NANOPARTICLES; IONIC-LAYER-ADSORPTION; DEPOSITION; PHOTOCONDUCTIVITY; NANOPARTICLES; Thin film; Titanium dioxide (TiO2); Chemical synthesis; Optical properties; Photoelectrochemical properties
- ISSN
- 0925-8388
- URI
- https://pubs.kist.re.kr/handle/201004/132395
- DOI
- 10.1016/j.jallcom.2008.11.160
- Appears in Collections:
- KIST Article > 2009
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