Epitaxial growth of MgO and Fe/MgO/Fe magnetic tunnel junctions on (100)-Si by molecular beam epitaxy

Authors
Miao, G. X.Chang, J. Y.van Veenhuizen, M. J.Thiel, K.Seibt, M.Eilers, G.Muenzenberg, M.Moodera, J. S.
Issue Date
2008-10-06
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.93, no.14
Abstract
Epitaxial growth of MgO barrier on Si is of technological importance due to the symmetry filtering effect of the MgO barrier in conjunction with bcc-ferromagnets. We study the epitaxial growth of MgO on (100)-Si by molecular beam epitaxy. MgO matches Si with 4:3 cell ratio, which renders Fe to be 45 degrees rotated relative to Si, in sharp contrast to the direct epitaxial growth of Fe on Si. The compressive strains from Si lead to the formation of small angle grain boundaries in MgO below 5 nm, and also affect the transport characteristics of Fe/MgO/Fe magnetic tunnel junctions formed on top. (C) 2008 American Institute of Physics. [DOI: 10.1063/ 1.2999633]
Keywords
ROOM-TEMPERATURE; THIN-FILMS; BUFFER LAYERS; SI(001); MAGNETORESISTANCE; ROOM-TEMPERATURE; THIN-FILMS; BUFFER LAYERS; SI(001); MAGNETORESISTANCE; magnetic tunnel junction; magnesium oxide; epitaxial growth; molecular beam epitaxy
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/133061
DOI
10.1063/1.2999633
Appears in Collections:
KIST Article > 2008
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