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dc.contributor.authorKim, Dong Hun-
dc.contributor.authorCho, Nam Gyu-
dc.contributor.authorKim, Ho-Gi-
dc.contributor.authorKim, Hyun-Suk-
dc.contributor.authorHong, Jae-Min-
dc.contributor.authorKim, Il-Doo-
dc.date.accessioned2024-01-20T23:02:06Z-
dc.date.available2024-01-20T23:02:06Z-
dc.date.created2021-09-03-
dc.date.issued2008-07-21-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/133313-
dc.description.abstractThe authors report on the dielectric and leakage current properties of room temperature grown MgO-Ba0.6Sr0.4TiO3 (MgO-BST) composite thin films to be utilized InGaZnO4 thin films transistors (TFTs) fabricated on a polyethylene terephthalate (PET) substrate. The InGaZnO4 TFTs with MgO-BST gate dielectrics exhibited low operation voltage of 4 V, high on/off current ratio of 4.13x10(6), and high field effect mobility of 10.86 cm(2)/V s. These results verify that a room temperature grown MgO-BST gate dielectric is a good candidate for producing high performance InGaZnO4 TFTs on plastic substrates. (C) 2008 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectAMORPHOUS OXIDE SEMICONDUCTORS-
dc.titleLow voltage operating InGaZnO4 thin film transistors using high-k MgO-Ba0.6Sr0.4TiO3 composite gate dielectric on plastic substrate-
dc.typeArticle-
dc.identifier.doi10.1063/1.2954014-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.93, no.3-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume93-
dc.citation.number3-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000257968700057-
dc.identifier.scopusid2-s2.0-48249112642-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusAMORPHOUS OXIDE SEMICONDUCTORS-
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