Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Kim, Bong Hoon | - |
dc.contributor.author | Shin, Dong Ok | - |
dc.contributor.author | Jeong, Seong-Jun | - |
dc.contributor.author | Koo, Chong Min | - |
dc.contributor.author | Jeon, Sang Chul | - |
dc.contributor.author | Hwang, Wook Jung | - |
dc.contributor.author | Lee, Sumi | - |
dc.contributor.author | Lee, Moon Gyu | - |
dc.contributor.author | Kim, Sang Ouk | - |
dc.date.accessioned | 2024-01-20T23:03:41Z | - |
dc.date.available | 2024-01-20T23:03:41Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 2008-06-18 | - |
dc.identifier.issn | 0935-9648 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/133390 | - |
dc.description.abstract | Hierarchical self-assembly of block copolymers has been achieved by two steps of sequential ordering processes, consisting of self-organized micropatterning from a dewetting block polymer solution and thermal annealing. The self-organized micropattern induces the spontaneous alignment of self-assembled lamellae (see figure), which is successfully applied for a lithography-free, ultra-large-scale nanopatterning. | - |
dc.language | English | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | SINGLE-LAYER FILMS | - |
dc.subject | THIN-FILMS | - |
dc.subject | PATTERNS | - |
dc.subject | ARRAYS | - |
dc.subject | SOLIDIFICATION | - |
dc.subject | NANOSTRUCTURE | - |
dc.subject | ORIENTATION | - |
dc.subject | CYLINDERS | - |
dc.subject | SURFACES | - |
dc.title | Hierarchical self-assembly of block copolymers for lithography-free nanopatterning | - |
dc.type | Article | - |
dc.identifier.doi | 10.1002/adma.200702285 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | ADVANCED MATERIALS, v.20, no.12, pp.2303 - + | - |
dc.citation.title | ADVANCED MATERIALS | - |
dc.citation.volume | 20 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | 2303 | - |
dc.citation.endPage | + | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000257268500010 | - |
dc.identifier.scopusid | 2-s2.0-54949119540 | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SINGLE-LAYER FILMS | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | PATTERNS | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | SOLIDIFICATION | - |
dc.subject.keywordPlus | NANOSTRUCTURE | - |
dc.subject.keywordPlus | ORIENTATION | - |
dc.subject.keywordPlus | CYLINDERS | - |
dc.subject.keywordPlus | SURFACES | - |
dc.subject.keywordAuthor | block copolymer | - |
dc.subject.keywordAuthor | self assembly | - |
dc.subject.keywordAuthor | soft patterning | - |
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