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dc.contributor.authorKim, J.-
dc.contributor.authorHam, J.-
dc.contributor.authorShim, W.-
dc.contributor.authorLee, K.-I.-
dc.contributor.authorJeon, K.J.-
dc.contributor.authorJeung, W.Y.-
dc.contributor.authorLee, W.-
dc.date.accessioned2024-01-20T23:32:46Z-
dc.date.available2024-01-20T23:32:46Z-
dc.date.created2021-09-02-
dc.date.issued2008-04-
dc.identifier.issn1225-0562-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/133613-
dc.description.abstractThe magneto-transport properties of an individual single crystalline Bi nanowire grown by a spontaneous growth method are reported. A four-terminal device based on an individual 400-nm-diameter nanowire was successfully fabricated using a plasma etching technique that removed an oxide layer that had formed on the surface of the nanowire. Large transverse ordinary magnetoresistance (1401%) and negative longitudinal ordinary magnetoresistance (-38%) were measured at 2 K. It was observed that the period of Shubnikov-de Haas oscillations in transverse geometry was 0.074T-1, 0.16T-1 and 0.77T-1, which is in good agreement with those of bulk Bi. However, it was found that the period of SdH oscillation in longitudinal geometry is 0.24T-1, which is larger than the value of 0.16T-1 reported for bulk Bi. The deviation is attributable to the spatial confinement arising from scattering at the nanowire surface boundary.-
dc.languageKorean-
dc.subjectElectron energy levels-
dc.subjectGalvanomagnetic effects-
dc.subjectMetalloids-
dc.subjectNanowires-
dc.subjectPlasma etching-
dc.subjectShubnikov-de Haas effect-
dc.subjectSingle crystals-
dc.subjectLandau energy level-
dc.subjectSpatial confinement effect-
dc.subjectBismuth-
dc.titleShubnikov-de Haas oscillations in an individual single-crystalline semimetal bismuth nanowire-
dc.typeArticle-
dc.identifier.doi10.3740/MRSK.2008.18.2.103-
dc.description.journalClass1-
dc.identifier.bibliographicCitationKorean Journal of Materials Research, v.18, no.2, pp.103 - 106-
dc.citation.titleKorean Journal of Materials Research-
dc.citation.volume18-
dc.citation.number2-
dc.citation.startPage103-
dc.citation.endPage106-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.identifier.scopusid2-s2.0-40749114298-
dc.type.docTypeArticle-
dc.subject.keywordPlusElectron energy levels-
dc.subject.keywordPlusGalvanomagnetic effects-
dc.subject.keywordPlusMetalloids-
dc.subject.keywordPlusNanowires-
dc.subject.keywordPlusPlasma etching-
dc.subject.keywordPlusShubnikov-de Haas effect-
dc.subject.keywordPlusSingle crystals-
dc.subject.keywordPlusLandau energy level-
dc.subject.keywordPlusSpatial confinement effect-
dc.subject.keywordPlusBismuth-
dc.subject.keywordAuthorLandau energy level-
dc.subject.keywordAuthorMagnetoresistance (MR)-
dc.subject.keywordAuthorShubnikov-de haas oscillations (SdH)-
dc.subject.keywordAuthorSingle-crystalline Bi nanowire-
dc.subject.keywordAuthorSpatial confinement effect-
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