Hierarchical ordering of block copolymer nanostructures by solvent annealing combined with controlled dewetting

Authors
Kim, Tae HeeHwang, JiyoungHwang, Won SeokHuh, JuneKim, Ho-CheolKim, Seung HyunHong, Jae MinThomas, Edwin L.Park, Cheolmin
Issue Date
2008-02-04
Publisher
WILEY-V C H VERLAG GMBH
Citation
ADVANCED MATERIALS, v.20, no.3, pp.522 - +
Abstract
A hierarchical nanostructure of PS-b-PEO is demonstrated (see figure) with a novel approach by solvent vapor annealing of a micropatterned block copolymer thin film selectively spun cast on microcontact printed surface of SAMs. Dewetting of the thin film, inevitable during the ordering of block copolymer microdomains upon solvent annealing, is strictly confined to the patterned regions, leading to the controlled micropatttern with nearly perfect ordering of PEO microdomains.
Keywords
THIN-FILMS; POLYMER-FILMS; ALIGNMENT; ARRAYS; NANOTECHNOLOGY; SOLIDIFICATION; MICRODOMAINS; PATTERNS; THIN-FILMS; POLYMER-FILMS; ALIGNMENT; ARRAYS; NANOTECHNOLOGY; SOLIDIFICATION; MICRODOMAINS; PATTERNS
ISSN
0935-9648
URI
https://pubs.kist.re.kr/handle/201004/133741
DOI
10.1002/adma.200700651
Appears in Collections:
KIST Article > 2008
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